Omnidirectional UV-IR reflector
First Claim
1. An omnidirectional UV-IR reflector comprising:
- a multilayer stack having an average thickness between 0.5 and 10 microns and between four and thirteen layers, said between four and thirteen layers having at least two first index of refraction material layers H1 and H2, and at least two second index of refraction material layers L1 and L2, said at least two first index of refraction material layers and said at least two second index of refraction material layers alternately stacked on top of each other such that said H1 layer is located between said L1 layer and said L2 layer, and said L2 layer is located between said H1 layer and said H2 layer;
said between four and thirteen layers each having a predefined thickness of dH1, dH2, dL1, dL2 with said dH1 thickness not generally equal to said dH2 thickness and said dL1 thickness not generally equal to said du thickness; and
wherein said multilayer stack when shined by light at incident angles between 0 to 45 degrees, has a first high reflectivity bandwidth with more than 50% reflectance of electromagnetic radiation having wavelengths less than about 400 nanometers, a second high reflectivity bandwidth with more than 80% reflectance of electromagnetic radiation having wavelengths greater than about 800 nanometers, and a low reflectivity bandwidth with less than 20% reflectance of electromagnetic radiation having wavelengths between about 400 nanometers to 800 nanometers.
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Abstract
The present invention provides an omnidirectional ultraviolet (UV)-infrared (IR) reflector. The omnidirectional UV-IR reflector includes a multilayer stack having at least three layers, the at least three layers having at least one first index of refraction material A1 and at least one second index of refraction layer B1. The at least one first index of refraction material layer and the at least one second index of refraction material layer can be alternately stacked on top of each other to provide the at least three layers. In addition, the at least one first index of refraction material layer and the at least one second index of refraction material layer each have a predefined thickness of dA1 and dB1, respectively, with the thickness dA1 not being generally equal to the dB1 thickness such that the multilayer stack has a non-periodic layered structure.
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Citations
9 Claims
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1. An omnidirectional UV-IR reflector comprising:
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a multilayer stack having an average thickness between 0.5 and 10 microns and between four and thirteen layers, said between four and thirteen layers having at least two first index of refraction material layers H1 and H2, and at least two second index of refraction material layers L1 and L2, said at least two first index of refraction material layers and said at least two second index of refraction material layers alternately stacked on top of each other such that said H1 layer is located between said L1 layer and said L2 layer, and said L2 layer is located between said H1 layer and said H2 layer; said between four and thirteen layers each having a predefined thickness of dH1, dH2, dL1, dL2 with said dH1 thickness not generally equal to said dH2 thickness and said dL1 thickness not generally equal to said du thickness; and wherein said multilayer stack when shined by light at incident angles between 0 to 45 degrees, has a first high reflectivity bandwidth with more than 50% reflectance of electromagnetic radiation having wavelengths less than about 400 nanometers, a second high reflectivity bandwidth with more than 80% reflectance of electromagnetic radiation having wavelengths greater than about 800 nanometers, and a low reflectivity bandwidth with less than 20% reflectance of electromagnetic radiation having wavelengths between about 400 nanometers to 800 nanometers. - View Dependent Claims (2, 3, 4, 5)
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6. A process for omnidirectionally reflecting UV and IR electromagnetic radiation, the process comprising:
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providing a multilayer stack having an average thickness between 0.5 and 10 microns and between four and thirteen layers, the between four and thirteen layers having at least two first index of refraction material layers H1 and H2, and at least two second index of refraction layers L1 and L2, the at least two first index of refraction material layers and the at least two second index of refraction material layers alternately stacked on top of each other such that the H1 layer is located between said L1 layer and said L2 layer, and said L2 layer is located between said H1 layer and said H2 layer; the between four and thirteen layers each having a predefined thickness of dH1, dH1, dL1, dL2 with the dH1 thickness not generally equal to the dH2 thickness and the dL1 thickness not generally equal to the dL2; wherein the multilayer stack when shined by white light at incident angles between 0 to 45 degrees, has a first high reflectivity bandwidth with more than 50% reflectance of electromagnetic radiation having a wavelength of less than about 400 nanometers, a second high reflectivity bandwidth with more than 80% reflectance of electromagnetic radiation having a wavelength of greater than about 800 nanometers, and a low reflectivity bandwidth with less than 20% reflectance of electromagnetic radiation having wavelengths between about 400 nanometers to 800 nanometers; providing a source of white light; exposing the multilayer stack to the source of white light; and the multilayer stack reflecting at least; 50% of electromagnetic radiation from the source of white light having wavelengths less than about 400 nanometers, at least 80% of electromagnetic radiation from the source of white light having wavelengths greater than about 800 nanometers and less than 20% of electromagnetic radiation from the source of white light having wavelengths between about 400 nanometers to 800 nanometers. - View Dependent Claims (7, 8, 9)
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Specification