Rule generating apparatus and method using lithography simulation
First Claim
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1. A design rule generating method comprising:
- receiving a test pattern;
providing a plurality of workflows which correspond to the test pattern and are preset in relation to a lithography model and a mask generation method; and
performing, using a special purpose computer, a simulation on the test pattern according to a workflow selected from the workflows.
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Abstract
A design rule generating method is provided. The method includes receiving a test pattern, providing a plurality of workflows, which correspond to the test pattern and are preset in relation to a lithography model and a mask generation method, and performing simulation on the test pattern according to a workflow selected from the workflows.
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Citations
20 Claims
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1. A design rule generating method comprising:
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receiving a test pattern; providing a plurality of workflows which correspond to the test pattern and are preset in relation to a lithography model and a mask generation method; and performing, using a special purpose computer, a simulation on the test pattern according to a workflow selected from the workflows. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A design rule generating method comprising:
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receiving a test pattern; providing a plurality of workflows, which correspond to the test pattern and are preset; performing, using a special purpose computer, a simulation on the test pattern according to one of the workflows selected from the workflows; analyzing results of the simulation; and extracting a design rule responsive to analyzing the results, wherein the workflows are determined based on at least one of whether source mask optimization (SMO) is to be performed, whether a usable lithography model exists, whether a new lithography model is to be generated, and a type of a mask generation method. - View Dependent Claims (12, 13, 14)
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15. A method, comprising:
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simulating, using a special purpose computer, a test pattern associated with a semiconductor device according to a workflow; and extracting a design rule based on simulating the test pattern; wherein simulating the test pattern and extracting the design rule are performed on a common processing apparatus. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification