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A-Si seasoning effect to improve SiN run-to-run uniformity

  • US 9,230,796 B2
  • Filed: 03/04/2015
  • Issued: 01/05/2016
  • Est. Priority Date: 08/16/2010
  • Status: Active Grant
First Claim
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1. A method for processing a substrate, comprising:

  • performing a first chamber seasoning process to deposit a first seasoning layer over a surface of a chamber component disposed in a processing chamber without any substrate being present;

    performing a deposition process to deposit a first material layer on a first batch of substrates within the processing chamber;

    after the last substrate of the first batch of substrates is deposited with the first material layer, performing a second chamber seasoning process to deposit a conductive seasoning layer over the surface of the chamber component disposed in the processing chamber without any substrate being present;

    after the second chamber seasoning process, performing the deposition process to deposit a second material layer on a second batch of substrates within the processing chamber; and

    after the last substrate of the second batch of substrates is deposited with the second material layer, performing a third chamber seasoning process to deposit a second seasoning layer over the surface of the chamber component disposed in the processing chamber without any substrate being present.

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