High dielectric constant etch stop layer for a memory structure
First Claim
1. A monolithic three-dimensional memory device, comprising:
- a high dielectric constant (high-k) dielectric material layer having a dielectric constant greater than 7.9 and located over a substrate;
a stack of alternating layers comprising insulator layers and electrically conductive layers and located over the high-k dielectric material layer;
a memory opening extending through the stack; and
a memory film and a semiconductor channel located within the memory opening, wherein;
the memory film is in contact with a top surface of the high-k dielectric material layer; and
a portion of the semiconductor channel extends through an opening in the high-k dielectric material layer and contacts a semiconductor material within the substrate.
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Accused Products
Abstract
A high dielectric constant (high-k) dielectric material layer having a dielectric constant greater than 7.9 is formed a substrate. A stack of alternating layers comprising first material layers and second material layers is formed over the high-k dielectric material layer. A memory opening is formed through the stack employing a top surface of the high-k dielectric material layer as an etchstop layer, thereby minimizing an overetch. A memory film and a semiconductor channel are subsequently formed. During formation of a backside contact trench, the high-k dielectric material layer can be employed as an etch stop layer. Thus, the high-k dielectric material layer can be employed as a common etch stop layer for formation of the memory opening and the backside contact trench.
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Citations
37 Claims
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1. A monolithic three-dimensional memory device, comprising:
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a high dielectric constant (high-k) dielectric material layer having a dielectric constant greater than 7.9 and located over a substrate; a stack of alternating layers comprising insulator layers and electrically conductive layers and located over the high-k dielectric material layer; a memory opening extending through the stack; and a memory film and a semiconductor channel located within the memory opening, wherein; the memory film is in contact with a top surface of the high-k dielectric material layer; and a portion of the semiconductor channel extends through an opening in the high-k dielectric material layer and contacts a semiconductor material within the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method of manufacturing a three-dimensional memory structure, comprising:
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forming a high dielectric constant (high-k) dielectric material layer having a dielectric constant greater than 7.9 over a substrate; forming a stack of alternating layers comprising first material layers and second material layers over the high-k dielectric material layer; forming a memory opening through the stack employing the high-k dielectric material layer as an etchstop layer; forming a memory film in the memory opening; forming an extension of the memory opening by an anisotropic etch of the high-k dielectric material layer employing at least the memory film as an etch mask, wherein the extension of the memory opening extends to the substrate; and forming a semiconductor channel on the memory film, wherein the semiconductor channel extends through the extension opening in the high-k dielectric material layer and contacts the substrate. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
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Specification