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Display device and manufacturing method thereof

  • US 9,235,074 B2
  • Filed: 08/07/2013
  • Issued: 01/12/2016
  • Est. Priority Date: 01/23/2013
  • Status: Expired due to Fees
First Claim
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1. A method of manufacturing a display device, comprising:

  • forming a thin film transistor on a substrate including a plurality of pixel areas;

    forming a pixel electrode connected to the thin film transistor in the pixel area;

    forming a sacrificial layer on the pixel electrode;

    forming a barrier layer on the sacrificial layer;

    forming a common electrode on the barrier layer;

    forming a roof layer on the common electrode;

    patterning the barrier layer, the common electrode, and the roof layer to expose a portion of the sacrificial layer, thereby forming an injection hole;

    removing the sacrificial layer to form a microcavity for a plurality of pixel areas;

    removing the barrier layer;

    injecting a liquid crystal into the microcavity through the injection hole; and

    forming an encapsulation layer on the roof layer to seal the microcavity,wherein the barrier layer is made of metal or metal oxide having a different etching rate from the common electrode.

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