Lithographic apparatus and device manufacturing method
First Claim
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1. An apparatus comprising:
- an optical column capable of projecting a beam on a target portion of a substrate, the optical column comprising a projection system configured to project the beam onto the target portion;
a scanning movement actuator to move the substrate with a scanning speed in a scanning direction with respect to the optical column; and
a rotating movement actuator to rotate the optical column or a part thereof with a rotating frequency resulting in a tangential rotation speed of the beam on the target portion,wherein the target portion has a height in the scanning direction and a tangential width mainly perpendicular to the scanning direction, wherein the scanning speed divided by the height substantially corresponds with the tangential rotation speed of the beam divided by the tangential width.
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Abstract
A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.
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Citations
20 Claims
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1. An apparatus comprising:
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an optical column capable of projecting a beam on a target portion of a substrate, the optical column comprising a projection system configured to project the beam onto the target portion; a scanning movement actuator to move the substrate with a scanning speed in a scanning direction with respect to the optical column; and a rotating movement actuator to rotate the optical column or a part thereof with a rotating frequency resulting in a tangential rotation speed of the beam on the target portion, wherein the target portion has a height in the scanning direction and a tangential width mainly perpendicular to the scanning direction, wherein the scanning speed divided by the height substantially corresponds with the tangential rotation speed of the beam divided by the tangential width. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A device manufacturing method comprising:
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projecting a beam on a target portion of a substrate using an optical column, the optical column comprising a projection system configured to project the beam onto the target portion; moving the substrate with a scanning speed in a scanning direction with respect to the optical column; and rotating the optical column or a part thereof with a rotating frequency resulting in a tangential rotation speed of the beam on the target portion, wherein the target portion has a height in the scanning direction and a tangential width mainly perpendicular to the scanning direction, wherein the scanning speed divided by the height substantially corresponds with the tangential rotation speed of the beam divided by the tangential width. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification