Gas supply member, plasma treatment method, and method of forming yttria-containing film
First Claim
Patent Images
1. A gas supply member forming an electrode in a chamber, the gas supply member comprising:
- an electrode constituting member provided with a gas supply passage, the gas supply passage including a gas flow channel and an exhaust port, the exhaust port being connected to a first connection part which is one end portion of the gas flow channel and being provided to a downstream side of the electrode constituting member, the electrode constituting member having a first flat surface at the downstream side; and
an yttria-containing film coating a part of the electrode constituting member, whereinat least a part of a surface constituting the exhaust port of the electrode constituting member is formed with a curved surface,the surface constituting the exhaust port and the first flat surface at the downstream side of the electrode constituting member are connected to each other by a smooth curved surface continuously,a diameter of the exhaust port increases as it goes far from the first connection part with the gas flow channel,a diameter of the gas flow channel is entirely constant from the one end portion connected to the exhaust portion to the other end portion intersecting with a second flat surface at an upstream side of the electrode constituting member, the second flat surface being parallel with the first flat surface, andthe yttria-containing film is formed on the surface constituting the exhaust port and on the first flat surface at the downstream side of the electrode constituting member and is not formed on an upstream side of the first connection part, the yttria-containing film having a curved surface.
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Abstract
According to one embodiment, a gas supply member is provided with a gas supply passage including a gas flow channel with a first diameter, and an exhaust port connected to one end portion of the gas flow channel and provided to a surface of a downstream side of the gas supply member. An yttria-containing film is formed on a surface constituting the exhaust port and the surface of the downstream side of the gas supply member. At least a part of the surface constituting the exhaust port is formed with a curved surface.
19 Citations
15 Claims
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1. A gas supply member forming an electrode in a chamber, the gas supply member comprising:
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an electrode constituting member provided with a gas supply passage, the gas supply passage including a gas flow channel and an exhaust port, the exhaust port being connected to a first connection part which is one end portion of the gas flow channel and being provided to a downstream side of the electrode constituting member, the electrode constituting member having a first flat surface at the downstream side; and an yttria-containing film coating a part of the electrode constituting member, wherein at least a part of a surface constituting the exhaust port of the electrode constituting member is formed with a curved surface, the surface constituting the exhaust port and the first flat surface at the downstream side of the electrode constituting member are connected to each other by a smooth curved surface continuously, a diameter of the exhaust port increases as it goes far from the first connection part with the gas flow channel, a diameter of the gas flow channel is entirely constant from the one end portion connected to the exhaust portion to the other end portion intersecting with a second flat surface at an upstream side of the electrode constituting member, the second flat surface being parallel with the first flat surface, and the yttria-containing film is formed on the surface constituting the exhaust port and on the first flat surface at the downstream side of the electrode constituting member and is not formed on an upstream side of the first connection part, the yttria-containing film having a curved surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification