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Gas supply member, plasma treatment method, and method of forming yttria-containing film

  • US 9,236,229 B2
  • Filed: 07/29/2011
  • Issued: 01/12/2016
  • Est. Priority Date: 08/12/2010
  • Status: Active Grant
First Claim
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1. A gas supply member forming an electrode in a chamber, the gas supply member comprising:

  • an electrode constituting member provided with a gas supply passage, the gas supply passage including a gas flow channel and an exhaust port, the exhaust port being connected to a first connection part which is one end portion of the gas flow channel and being provided to a downstream side of the electrode constituting member, the electrode constituting member having a first flat surface at the downstream side; and

    an yttria-containing film coating a part of the electrode constituting member, whereinat least a part of a surface constituting the exhaust port of the electrode constituting member is formed with a curved surface,the surface constituting the exhaust port and the first flat surface at the downstream side of the electrode constituting member are connected to each other by a smooth curved surface continuously,a diameter of the exhaust port increases as it goes far from the first connection part with the gas flow channel,a diameter of the gas flow channel is entirely constant from the one end portion connected to the exhaust portion to the other end portion intersecting with a second flat surface at an upstream side of the electrode constituting member, the second flat surface being parallel with the first flat surface, andthe yttria-containing film is formed on the surface constituting the exhaust port and on the first flat surface at the downstream side of the electrode constituting member and is not formed on an upstream side of the first connection part, the yttria-containing film having a curved surface.

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