Three dimensional NAND device and method of making thereof
First Claim
1. A method of making a monolithic three dimensional NAND string, comprising:
- forming a stack of alternating layers of a first material and a second material different from the first material over a substrate, the first material layers comprising a sacrificial material and the second material layers comprising an electrically insulating material;
forming at least one front side opening in the stack;
forming an etch stop layer comprising polysilicon over a sidewall of the at least one front side opening;
forming a memory film comprising a different material than the etch stop layer in the at least one front side opening;
forming a semiconductor channel over the memory film in the at least one front side opening;
forming a back side opening in the stack;
selectively removing the first material layers without removing the second material layers through the back side opening, thereby forming back side recesses between adjacent second material layers and exposing portions of the etch stop layer located in a back portion of the back side recesses;
converting the etch stop layer into a vertically alternating stack of silicon oxide segments and polysilicon segments by oxidizing the exposed portions of the etch stop layer in the back side recesses while the memory material layer remains unchanged, wherein the etch stop layer is a single contiguous layer extending along the sidewall of the at least one front side opening prior to conversion, wherein each silicon oxide segment is an oxidized portion of the etch stop layer after the conversion, and each polysilicon segment is an unoxidized remaining portion of the etch stop layer after the conversion;
forming a blocking dielectric over a sidewall in the back side opening and over exposed surfaces of the second material layers and the silicon oxide segments, the blocking dielectric having a clam-shaped portion in the back side recesses; and
forming a plurality of control gate electrodes, each of the plurality of control gate electrodes is located at least partially in an opening in a respective clam-shaped portion of the blocking dielectric.
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Accused Products
Abstract
A monolithic three dimensional NAND string includes a semiconductor channel, at least one end part of the semiconductor channel extending substantially perpendicular to a major surface of a substrate and a plurality of control gate electrodes extending substantially parallel to the major surface of the substrate. The NAND string also includes a memory film located between the semiconductor channel and the plurality of control gate electrodes and a blocking dielectric containing a plurality of clam-shaped portions each having two horizontal portions connected by a vertical portion. The NAND string also includes a plurality of discrete cover silicon oxide segments located between the memory film and each respective clam-shaped portion of the blocking dielectric containing a respective control gate electrode. Each of the plurality of cover silicon oxide segments has curved upper and lower sides and substantially straight vertical sidewalls.
83 Citations
11 Claims
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1. A method of making a monolithic three dimensional NAND string, comprising:
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forming a stack of alternating layers of a first material and a second material different from the first material over a substrate, the first material layers comprising a sacrificial material and the second material layers comprising an electrically insulating material; forming at least one front side opening in the stack; forming an etch stop layer comprising polysilicon over a sidewall of the at least one front side opening; forming a memory film comprising a different material than the etch stop layer in the at least one front side opening; forming a semiconductor channel over the memory film in the at least one front side opening; forming a back side opening in the stack; selectively removing the first material layers without removing the second material layers through the back side opening, thereby forming back side recesses between adjacent second material layers and exposing portions of the etch stop layer located in a back portion of the back side recesses; converting the etch stop layer into a vertically alternating stack of silicon oxide segments and polysilicon segments by oxidizing the exposed portions of the etch stop layer in the back side recesses while the memory material layer remains unchanged, wherein the etch stop layer is a single contiguous layer extending along the sidewall of the at least one front side opening prior to conversion, wherein each silicon oxide segment is an oxidized portion of the etch stop layer after the conversion, and each polysilicon segment is an unoxidized remaining portion of the etch stop layer after the conversion; forming a blocking dielectric over a sidewall in the back side opening and over exposed surfaces of the second material layers and the silicon oxide segments, the blocking dielectric having a clam-shaped portion in the back side recesses; and forming a plurality of control gate electrodes, each of the plurality of control gate electrodes is located at least partially in an opening in a respective clam-shaped portion of the blocking dielectric. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification