Systems and methods of automatic boundary control for semiconductor processes
First Claim
1. A method of automatically calculating boundaries for a semiconductor fabrication process, comprising:
- selecting a first parameter for monitoring during a semiconductor fabrication process;
receiving a first set of values for the first parameter;
determining an average value for the values in the first set;
normalizing each value in the first set of values;
selecting a first weighting factor based on a number of values in the first set;
generating a first and a second boundary value by computing;
σ
L=√
((σ
L—
normalized)2+(σ
element—
mean)2),wherein σ
L denotes an overall standard deviation for the values in the first set, σ
L—
normalized denotes the standard deviation of the normalized values in the first set, σ
element—
mean denotes the standard deviation of the average value for the values in the first set; and
applying the first and second boundary values to control the semiconductor fabrication process.
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Abstract
A system and method of automatically calculating boundaries for a semiconductor fabrication process. The method includes selecting a first parameter for monitoring during a semiconductor fabrication process. A first set of values for the first parameter are received and a group value of the first set is determined. Each value in the first set of values is normalized. A first weighting factor is selected based on a number of values in the first set. The embodiment also includes generating a first and a second boundary value as a function of the weighting factor, the first set normalized values and the group value of the first set and applying the first and second boundary values to control the semiconductor fabrication process.
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Citations
20 Claims
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1. A method of automatically calculating boundaries for a semiconductor fabrication process, comprising:
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selecting a first parameter for monitoring during a semiconductor fabrication process; receiving a first set of values for the first parameter; determining an average value for the values in the first set; normalizing each value in the first set of values; selecting a first weighting factor based on a number of values in the first set; generating a first and a second boundary value by computing;
σ
L=√
((σ
L— normalized)2+(σ
element— mean)2),wherein σ
L denotes an overall standard deviation for the values in the first set, σ
L— normalized denotes the standard deviation of the normalized values in the first set, σ
element— mean denotes the standard deviation of the average value for the values in the first set; andapplying the first and second boundary values to control the semiconductor fabrication process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A non-transitory computer readable storage medium having instructions stored tangibly thereon, the instructions when executed by a processor causing the processor to perform the operations of:
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selecting a first parameter for monitoring during a semiconductor fabrication process; receiving a first set of values for the first parameter; determining a group value of the first set; normalizing each value in the first set of values by determining an offset to zero the group value of the first set of values and adjusting each value in the first set of values based on the offset; selecting a first weighting factor based on a number of values in the first set; generating a first and a second boundary value as a function of the weighting factor, the first set normalized values and the group value of the first set; and applying the first and second boundary values to control the semiconductor fabrication process. - View Dependent Claims (16, 17, 18, 19)
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20. A system for automatically calculating boundaries for a semiconductor fabrication process, comprising:
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a monitoring device to monitor a selected first parameter during a semiconductor fabrication process; a data determining device to determine a group value of a first set of values for the first parameter; a data normalizer to normalize each value in the first set of values by determining an offset to zero the group value of the first set of values and adjusting each value in the first set of values based on the offset; a counter to determine a number of values in the first set; a generator to generate a first and a second boundary value as a function of a selected first weighting factor, the first set normalized values and the group value of the first set; and an interface to apply the first and second boundary values to a controller to control performance of at least a portion of the semiconductor fabrication process.
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Specification