×

Methods for promoting semiconductor manufacturing yield and classifying defects during fabricating a semiconductor device, and computer readable mediums encoded with a computer program implementing the same

  • US 9,251,581 B1
  • Filed: 03/28/2011
  • Issued: 02/02/2016
  • Est. Priority Date: 09/14/2010
  • Status: Active Grant
First Claim
Patent Images

1. A method for promoting semiconductor manufacturing yield of a multilayered device, comprising steps of:

  • inspecting a processed layer of the multilayered device to identify defects such that an inspected image with the defects thereon is generated;

    aligning the inspected image to an original design layout information of the processed layer to determine the locations of the defects in the processed layer; and

    classifying the defects on the inspected image according to the locations of the defects, patterned geometric features of the original design layout information of the processed layer and patterned geometric features of at least one previous layer and/or at least one next layer of the multilayered device.

View all claims
  • 3 Assignments
Timeline View
Assignment View
    ×
    ×