Three-dimensional gallium nitride (GaN) pillar structure light emitting diode (LED)
First Claim
1. A light emitting diode (LED) with three-dimensional gallium nitride (GaN) pillar structures having planar surfaces, the LED comprising:
- a substrate with a top surface having a plurality of first electrode digits formed in a first metal layer, and a plurality of opposing second electrode digits formed in a second metal layer;
a plurality of GaN pillar structures, each GaN pillar structure bridging a gap between a first electrode digit and a corresponding second electrode digit;
each GaN pillar structure comprising;
an n-doped GaN (n-GaN) pillar having a first end overlying a corresponding first electrode digit, a second end connected to a corresponding second electrode digit, with at least one of the ends formed in a c-plane, and planar sidewalls perpendicular to the c-plane, formed in a plane selected from a group consisting of an m-plane and a-plane family;
a multiple quantum well (NNW) layer overlying the n-GaN pillar sidewalls and the GaN pillar first end; and
,a layer of p-doped GaN (p-GaN) overlying the MQW layer.
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Abstract
A method is provided for fabricating a light emitting diode (LED) using three-dimensional gallium nitride (GaN) pillar structures with planar surfaces. The method forms a plurality of GaN pillar structures, each with an n-doped GaN (n-GaN) pillar and planar sidewalls perpendicular to the c-plane, formed in either an m-plane or a-plane family. A multiple quantum well (MQW) layer is formed overlying the n-GaN pillar sidewalls, and a layer of p-doped GaN (p-GaN) is formed overlying the MQW layer. The plurality of GaN pillar structures are deposited on a first substrate, with the n-doped GaN pillar sidewalls aligned parallel to a top surface of the first substrate. A first end of each GaN pillar structure is connected to a first metal layer. The second end of each GaN pillar structure is etched to expose the n-GaN pillar second end and connected to a second metal layer.
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Citations
19 Claims
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1. A light emitting diode (LED) with three-dimensional gallium nitride (GaN) pillar structures having planar surfaces, the LED comprising:
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a substrate with a top surface having a plurality of first electrode digits formed in a first metal layer, and a plurality of opposing second electrode digits formed in a second metal layer; a plurality of GaN pillar structures, each GaN pillar structure bridging a gap between a first electrode digit and a corresponding second electrode digit; each GaN pillar structure comprising; an n-doped GaN (n-GaN) pillar having a first end overlying a corresponding first electrode digit, a second end connected to a corresponding second electrode digit, with at least one of the ends formed in a c-plane, and planar sidewalls perpendicular to the c-plane, formed in a plane selected from a group consisting of an m-plane and a-plane family; a multiple quantum well (NNW) layer overlying the n-GaN pillar sidewalls and the GaN pillar first end; and
,a layer of p-doped GaN (p-GaN) overlying the MQW layer. - View Dependent Claims (2, 3, 14, 15, 16, 17, 18, 19)
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4. A method for fabricating a light emitting diode (LED) using three-dimensional gallium (GaN) pillar structures with planar surfaces, the method comprising:
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depositing the plurality of GaN pillar structures on a first substrate, having a first end, a second end, with at least one of the ends formed in a c-plane, and planar sidewalls perpendicular to the c-plane and formed in an a-plane family, with the n-doped GaN pillar sidewalls aligned parallel to a top surface of the first substrate; connecting a first end of each GaN pillar structure to a first metal layer to form a first electrode; etching a second end of each GaN pillar structure to expose the n-GaN pillar second end; and
,subsequent to etching the second end of each GaN pillar structure, connecting the second end of each GaN pillar structure to a second metal layer to form a second electrode. - View Dependent Claims (5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification