Method for integrated circuit mask patterning
First Claim
1. A method of transforming a first integrated circuit (IC) pattern, wherein the first IC pattern includes a shape that is not one of a plurality of user-defined shapes, the method comprising the steps of:
- using a computer, deriving a second IC pattern approximating the first IC pattern, wherein the second IC pattern includes a shape that is one of the plurality of user-defined shapes;
calculating a pattern approximation error between the first IC pattern and the second IC pattern; and
upon a condition in which the pattern approximation error is greater than a user-defined threshold, performing the steps of;
splitting the first IC pattern into a plurality of sub-patterns; and
recursively transforming each of the plurality of sub-patterns.
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Abstract
Provided is a method of transforming an integrated circuit (IC) pattern into one or more patterns suitable for subsequent processing, such as mask fabrication. The method includes receiving an IC pattern that has an arbitrary shape, and using a computer, deriving an approximation IC pattern, wherein the approximation IC pattern is in a shape that is a user-defined fabrication-friendly shape, such as a rectangle or an ellipse. The method further includes calculating a pattern approximation error between the IC pattern and the approximation IC pattern. The method further includes checking whether the pattern approximation error is less than a user-defined threshold. If it is, the method further includes outputting the approximation IC pattern for subsequent fabrication. Otherwise, the method further includes splitting the IC pattern into a plurality of subparts, and recursively transforming each of the plurality of subparts.
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Citations
20 Claims
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1. A method of transforming a first integrated circuit (IC) pattern, wherein the first IC pattern includes a shape that is not one of a plurality of user-defined shapes, the method comprising the steps of:
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using a computer, deriving a second IC pattern approximating the first IC pattern, wherein the second IC pattern includes a shape that is one of the plurality of user-defined shapes; calculating a pattern approximation error between the first IC pattern and the second IC pattern; and upon a condition in which the pattern approximation error is greater than a user-defined threshold, performing the steps of; splitting the first IC pattern into a plurality of sub-patterns; and recursively transforming each of the plurality of sub-patterns. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of converting an IC mask pattern that is not a rectangular shape into at least one rectangle for mask fabrication, comprising:
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using a computer, determining a rectangle approximating the IC mask pattern, wherein the rectangle and the IC mask pattern share a center of mass; calculating a pattern approximation error between the rectangle and the IC mask pattern; when the pattern approximation error is less than a user-defined threshold, accepting the rectangle as a replacement of the IC mask pattern in subsequent mask fabrication, otherwise, splitting the IC mask pattern into two subparts; and recursively converting each of the two subparts that is not already a rectangular shape into at least one rectangle. - View Dependent Claims (12, 13, 14, 15, 16)
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17. A method comprising the steps of:
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receiving an integrated circuit (IC) design layout, the IC design layout having a first pattern that is not in a rectangular shape; using a computer, determining a rectangle approximating the first pattern; calculating a deviation between the first pattern and the rectangle; and upon a condition in which the deviation is less than a user-defined threshold, replacing the first pattern with the rectangle in the IC design layout, otherwise, performing the steps of; splitting the first pattern into a plurality of subparts; and for each of the plurality of subparts, recursively performing the steps of determining, calculating, conditionally replacing, and conditionally splitting. - View Dependent Claims (18, 19, 20)
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Specification