Technique for forming a MEMS device
First Claim
1. An apparatus formed on a substrate including at least one semiconductor device, the apparatus comprising:
- a microelectromechanical system (MEMS) device comprising a portion of a first structural layer and a portion of a second structural layer formed above the first structural layer, the second structural layer having a thickness greater than a thickness of the first structural layer,wherein the MEMS device comprises a member comprising the portion of the first structural layer and the portion of the second structural layer,wherein the portion of the second structural layer is an attachment attached to the first portion of the first structural layer.
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Accused Products
Abstract
An apparatus is formed on a substrate including at least one semiconductor device. The apparatus includes a microelectromechanical system (MEMS) device comprising at least one of a portion of a first structural layer and a portion of a second structural layer formed above the first structural layer. The second structural layer has a thickness substantially greater than a thickness of the first structural layer. In at least one embodiment, the MEMS device includes a first portion of the second structural layer and a second portion of the second structural layer. In at least one embodiment, the MEMS device further comprises a gap between the first portion of the second structural layer and the second portion of the second structural layer. In at least one embodiment, the gap has a width at least one order of magnitude less than the thickness of the second structural layer.
33 Citations
19 Claims
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1. An apparatus formed on a substrate including at least one semiconductor device, the apparatus comprising:
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a microelectromechanical system (MEMS) device comprising a portion of a first structural layer and a portion of a second structural layer formed above the first structural layer, the second structural layer having a thickness greater than a thickness of the first structural layer, wherein the MEMS device comprises a member comprising the portion of the first structural layer and the portion of the second structural layer, wherein the portion of the second structural layer is an attachment attached to the first portion of the first structural layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. An apparatus comprising:
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an electrode of a microelectromechanical system (MEMS) device formed above a substrate including a semiconductor device; and a member of the MEMS device, the member being formed above the substrate and electrostatically coupled to the electrode, the member including a portion of a first structural layer and a portion of a second structural layer formed above the first structural layer, wherein the portion of the second structural layer has a higher mass than the portion of the first structural layer, wherein the portion of the second structural layer is an attachment attached to the first portion of the first structural layer. - View Dependent Claims (16, 17, 18, 19)
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Specification