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Lithographic apparatus, substrate and device manufacturing method

  • US 9,261,772 B2
  • Filed: 03/29/2013
  • Issued: 02/16/2016
  • Est. Priority Date: 04/16/2012
  • Status: Active Grant
First Claim
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1. A method comprising:

  • illuminating a target structure using a spot size that is larger than the target structure, wherein the target structure includes a progressive optical contrast transition at peripheral edges of the target structure; and

    measuring a diffraction pattern of the target structure, wherein a diffraction effect at the peripheral edges of the target structure is substantially reduced by the progressive optical contrast transition.

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