Integration of lithography apparatus and mask optimization process with multiple patterning process
First Claim
1. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns, the method comprising:
- identifying a plurality of possible split choices for splitting the pattern into the plurality of sub-patterns;
selecting one of the identified possible split choices based on a prediction of an image of at least one sub-pattern split under each of the split choices, where the image is formed by the at least one sub-pattern after an optical setting of a lithography apparatus used in the lithographic process and the at least one sub-pattern are co-optimized, and where the image is formed by the at least one sub-pattern in a respective split choice and without regard to other sub-patterns in the same respective split choice; and
splitting the pattern into the plurality of sub-patterns under the selected one of the possible split choices.
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Abstract
The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns is disclosed, wherein the method comprises a splitting step being configured to be aware of requirements of a co-optimization between at least one of the sub-patterns and an optical setting of the lithography apparatus used for the lithographic process. Device characteristic optimization techniques, including intelligent pattern selection based on diffraction signature analysis, may be integrated into the multiple patterning process flow.
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Citations
21 Claims
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1. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns, the method comprising:
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identifying a plurality of possible split choices for splitting the pattern into the plurality of sub-patterns; selecting one of the identified possible split choices based on a prediction of an image of at least one sub-pattern split under each of the split choices, where the image is formed by the at least one sub-pattern after an optical setting of a lithography apparatus used in the lithographic process and the at least one sub-pattern are co-optimized, and where the image is formed by the at least one sub-pattern in a respective split choice and without regard to other sub-patterns in the same respective split choice; and splitting the pattern into the plurality of sub-patterns under the selected one of the possible split choices. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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Specification