Advanced transistors with punch through suppression
First Claim
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1. A die, comprising:
- a substrate that is a single crystal of semiconductor material;
a plurality of field effect transistor structures supported by the substrate each having a gate, a source, and a drain;
wherein at least one of the transistor structures has a plurality of distinct doped regions underlying the gate and extending between the source and drain, the plurality of doped regions implanted to define a dopant profile of p-type or n-type material for the at least one of the transistor structures, the dopant profile having a peak dopant concentration at a first depth from the gate, a first intermediate dopant concentration at a second depth from the gate, the first intermediate dopant concentration being lower than the peak dopant concentration;
wherein each of the plurality of transistor structures includes a channel region commonly formed by an undoped blanket epitaxial growth, the channel region being directly on a threshold voltage control region formed in the single crystal of the single semiconductor material, the threshold voltage control region associated with the first intermediate dopant concentration.
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Abstract
An advanced transistor with punch through suppression includes a gate with length Lg, a well doped to have a first concentration of a dopant, and a screening region positioned under the gate and having a second concentration of dopant. The second concentration of dopant may be greater than 5×1018 dopant atoms per cm3. At least one punch through suppression region is disposed under the gate between the screening region and the well. The punch through suppression region has a third concentration of a dopant intermediate between the first concentration and the second concentration of dopant. A bias voltage may be applied to the well region to adjust a threshold voltage of the transistor.
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Citations
18 Claims
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1. A die, comprising:
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a substrate that is a single crystal of semiconductor material; a plurality of field effect transistor structures supported by the substrate each having a gate, a source, and a drain; wherein at least one of the transistor structures has a plurality of distinct doped regions underlying the gate and extending between the source and drain, the plurality of doped regions implanted to define a dopant profile of p-type or n-type material for the at least one of the transistor structures, the dopant profile having a peak dopant concentration at a first depth from the gate, a first intermediate dopant concentration at a second depth from the gate, the first intermediate dopant concentration being lower than the peak dopant concentration; wherein each of the plurality of transistor structures includes a channel region commonly formed by an undoped blanket epitaxial growth, the channel region being directly on a threshold voltage control region formed in the single crystal of the single semiconductor material, the threshold voltage control region associated with the first intermediate dopant concentration. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification