Methods for forming interconnects in microelectronic workpieces and microelectronic workpieces formed using such methods
First Claim
1. A method of processing a microelectronic workpiece including a semiconductor substrate having a plurality of microelectronic dies, the individual dies including integrated circuitry and a terminal electrically coupled to the integrated circuitry, the method comprising:
- forming a first opening in the substrate from a back side of the substrate toward a front side of the substrate and in alignment with the terminal, the first opening having a generally annular cross-sectional profile and separating an island of substrate material from the substrate;
depositing an insulating material into at least a portion of the first opening, wherein depositing an insulating material comprises at least generally filling the first opening with the insulating material and covering the entire back side of the substrate with the insulating material;
removing at least approximately all the insulating material from the back side of the substrate outside the first opening;
applying a photosensitive polymer material directly onto the back side of the substrate;
forming a second opening in the photosensitive polymer material, wherein the second opening has a diameter less than a diameter of the first opening, and wherein a wall of the second opening is aligned with at least a portion of the insulating material within the first opening; and
removing the island of substrate material after depositing the insulating material and forming a third opening aligned with at least a portion of the terminal, wherein the third opening does not extend completely through the terminal.
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Abstract
Methods for forming interconnects in microelectronic workpieces and microelectronic workpieces formed using such methods are disclosed herein. One embodiment, for example, is directed to a method of processing a microelectronic workpiece including a semiconductor substrate having a plurality of microelectronic dies. The method can include forming a first opening in the substrate from a back side of the substrate toward a front side and in alignment with terminals of the dies. The first opening separates an island of substrate material from the substrate. The method can also include depositing an insulating material into at least a portion of the first opening, and then removing the island of substrate material to form a second opening. In several embodiments, the method may include constructing an electrically conductive interconnect in at least a portion of the second opening and in electrical contact with the terminal.
494 Citations
17 Claims
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1. A method of processing a microelectronic workpiece including a semiconductor substrate having a plurality of microelectronic dies, the individual dies including integrated circuitry and a terminal electrically coupled to the integrated circuitry, the method comprising:
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forming a first opening in the substrate from a back side of the substrate toward a front side of the substrate and in alignment with the terminal, the first opening having a generally annular cross-sectional profile and separating an island of substrate material from the substrate; depositing an insulating material into at least a portion of the first opening, wherein depositing an insulating material comprises at least generally filling the first opening with the insulating material and covering the entire back side of the substrate with the insulating material; removing at least approximately all the insulating material from the back side of the substrate outside the first opening; applying a photosensitive polymer material directly onto the back side of the substrate; forming a second opening in the photosensitive polymer material, wherein the second opening has a diameter less than a diameter of the first opening, and wherein a wall of the second opening is aligned with at least a portion of the insulating material within the first opening; and removing the island of substrate material after depositing the insulating material and forming a third opening aligned with at least a portion of the terminal, wherein the third opening does not extend completely through the terminal. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method of processing a semiconductor substrate including a via site and a plug site within the via site, the method comprising:
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masking the plug site and a region at least partially surrounding the via site at a back side of the substrate, wherein masking includes exposing a perimeter of the via site; etching the substrate after masking and defining a plug at the plug site, wherein the plug is at least partially aligned with an electrical contact on the substrate, and wherein etching the substrate after masking defines a plug having an elevation extending generally as high as an elevation of the region; dispensing a first insulation onto the substrate, over the plug, and between the plug and the substrate; exposing the plug after dispensing the first insulation; dispensing a volume of a second insulation directly onto the back side of the substrate after exposing the plug, wherein dispensing the volume of second insulation comprises dispensing a photosensitive polymer material directly onto the back side of the substrate, and wherein the volume of second insulation dispensed onto the back side of the substrate covers at least a portion of the first insulation; patterning the second insulation such that at least a first portion of the first insulation remains covered, at least a second portion of the first insulation is exposed and an exterior surface of the plug is exposed; and removing the plug. - View Dependent Claims (14, 15, 16, 17)
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Specification