Microelectronic packages having texturized solder pads and methods for the fabrication thereof
First Claim
Patent Images
1. A method for fabricating a microelectronic package, comprising:
- photolitographically patterning an under-pad dielectric layer to create a texturized dielectric region having a texture pattern and to create via openings extending through the under-pad dielectric layer; and
producing a texturized solder pad over the texturized dielectric region, the texturized solder pad having a solder contact surface to which the texture pattern is transferred such that the area of the solder contact surface is increased relative to a non-texturized solder pad of equivalent dimensions;
wherein the patterning comprises;
treating the region of the under-pad dielectric layer in which the texture pattern is formed with ultraviolet (UV) light at a first predetermined dosage;
treating the regions of the under-pad dielectric layer in which the via openings are formed with UV light at a second predetermined dosage greater than the first predetermined dosage; and
developing the under-pad dielectric layer to simultaneously form the via openings and the texture pattern.
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Abstract
Microelectronic packages and methods for fabricating microelectronic packages having texturized solder pads, which can improve solder joint reliability, are provided. In one embodiment, the method includes forming a texturized dielectric region having a texture pattern, such as a hatch pattern, in an under-pad dielectric layer. A texturized solder pad is produced over the texturized dielectric region. The texturized solder pad has a solder contact surface to which the texture pattern is transferred such that the area of the solder contact surface is increased relative to a non-texturized solder pad of equivalent dimensions.
15 Citations
20 Claims
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1. A method for fabricating a microelectronic package, comprising:
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photolitographically patterning an under-pad dielectric layer to create a texturized dielectric region having a texture pattern and to create via openings extending through the under-pad dielectric layer; and producing a texturized solder pad over the texturized dielectric region, the texturized solder pad having a solder contact surface to which the texture pattern is transferred such that the area of the solder contact surface is increased relative to a non-texturized solder pad of equivalent dimensions; wherein the patterning comprises; treating the region of the under-pad dielectric layer in which the texture pattern is formed with ultraviolet (UV) light at a first predetermined dosage; treating the regions of the under-pad dielectric layer in which the via openings are formed with UV light at a second predetermined dosage greater than the first predetermined dosage; and developing the under-pad dielectric layer to simultaneously form the via openings and the texture pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for fabricating a microelectronic package, comprising:
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depositing a photoimagable dielectric layer over a semiconductor die; photolitographically patterning the photoimagable dielectric layer to define texturized dielectric regions at selected locations across the first photoimagable dielectric layer and to further define via openings at different locations across the first photoimagable dielectric layer, the texturized dielectric regions having a maximum feature depth less than the depth of the via openings as taken from an upper surface of the photoimagable dielectric layer; producing a patterned metal level over the photoimagable dielectric layer, the patterned metal level produced to include (i) texturized solder pads formed over the texturized dielectric regions, and (ii) interconnect lines electrically coupling the solder pads to the semiconductor die; forming a solder mask layer having solder mask openings through which the texturized solder pads are exposed; and forming solder contacts in the solder mask openings and bonded to the texturized solder pads. - View Dependent Claims (11, 12, 13)
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14. A microelectronic package, comprising:
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a first photoimagable dielectric layer in which a texturized dielectric region having a texture pattern is formed, the first photoimagable dielectric layer having a thickness greater than a maximum feature depth of the texture pattern; a texturized solder pad overlying the texturized dielectric region and having a solder contact surface, the texturized solder pad substantially conformal with the texturized dielectric region such that the texture pattern is transferred to the solder contact surface; a solder contact overlying the texturized solder pad and bonded to the solder contact surface; a semiconductor die; and a molded package body having a fan-out region extending around the semiconductor die, the texturized dielectric region located over the fan-out region. - View Dependent Claims (15, 16, 17, 18)
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19. A microelectronic package, comprising:
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a first photoimagable dielectric layer in which a texturized dielectric region having a texture pattern is formed, the first photoimagable dielectric layer having a thickness greater than a maximum feature depth of the texture pattern; a texturized solder pad overlying the texturized dielectric region and having a solder contact surface, the texturized solder pad substantially conformal with the texturized dielectric region such that the texture pattern is transferred to the solder contact surface; a solder contact overlying the texturized solder pad and bonded to the solder contact surface; a semiconductor die having a bond pad; a photoimagable dielectric layer in which the texturized dielectric region is formed; and an interconnect line overlying the photoimagable dielectric layer and electrically coupling the bond pad to the texturized solder pad; wherein the interconnect line has an average thickness, and wherein the texturized dielectric region has a minimum feature width greater than twice the average thickness of the interconnect line. - View Dependent Claims (20)
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Specification