Manufacturing method of semiconductor device

• US 9,287,390 B2
• Filed: 05/22/2014
• Issued: 03/15/2016
• Est. Priority Date: 08/16/2010
• Status: Active Grant

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Noda, Kosei, Sasaki, Toshinari
• Primary Examiner(s): Lee, Hsien Ming
• Application Number:
  US14/284,771
• Publication Number:
  US 20140256086A1
• Time in Patent Office: 663 Days
• Field of Search: 438/104, 438/149, 438/157, 438/161, 438/164, 257/43, 257/66, 257/67, 257/72
• US Class Current: 1/1
• CPC Class Codes: H01L 21/02164 the material being a silicon oxide, e.g. SiO2
• CPC Class Codes: H01L 21/465 Chemical or electrical treatment, e.g. electrolytic etching to form insulating layers H01L21/469
• CPC Class Codes: H01L 21/477 Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering H01L21/38 - H01L21/449 and H01L21/461 - H01L21/475 take precedence
• CPC Class Codes: H01L 22/10 Measuring as part of the manufacturing process burn-in G01R31/2855
• CPC Class Codes: H01L 29/40114 the electrodes comprising a conductor-insulator-conductor-insulator-semiconductor structure
• CPC Class Codes: H01L 29/4908 for thin film semiconductor, e.g. gate of TFT
• CPC Class Codes: H01L 29/66969 of devices having semiconductor bodies not comprising group 14 or group 13/15 materials comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials, comprising cuprous oxide or cuprous iodide H01L21/02365
• CPC Class Codes: H01L 29/78603 characterised by the insulating substrate or support H01L29/78657 takes precedence
• CPC Class Codes: H01L 29/7869 having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate

Abstract

A transistor with superior electric characteristics is manufactured. An oxide insulating film is formed over a substrate, an oxide semiconductor film is formed over the oxide insulating film, heat treatment is then conducted at a temperature at which hydrogen contained in the oxide semiconductor film is desorbed and part of oxygen contained in the oxide insulating film is desorbed, then the heated oxide semiconductor film is etched into a predetermined shape to form an island-shaped oxide semiconductor film, a pair of electrodes is formed over the island-shaped oxide semiconductor film, a gate insulating film is formed over the pair of electrodes and the island-shaped oxide semiconductor film, and a gate electrode is formed over the gate insulating film.

Claims

1. A method for manufacturing a semiconductor device comprising the steps of:

forming an oxide insulating film over a substrate, wherein the oxide insulating film contains oxygen with a higher proportion than a proportion of oxygen in a stoichiometric composition;

forming an oxide semiconductor film on and in contact with the oxide insulating film;

reducing hydrogen concentration and oxygen vacancies in the oxide semiconductor film by performing a heat treatment;

etching parts of the oxide semiconductor film to form an island-shaped oxide semiconductor film;

forming a gate insulating film over the island-shaped oxide semiconductor film; and

forming a gate electrode overlapping with the island-shaped oxide semiconductor film with the gate insulating film interposed therebetween,

wherein an amount of oxygen desorbed from the oxide insulating film by the heat treatment is higher than or equal to 1.0×

10²⁰ atoms/cm³.

2. The method for manufacturing a semiconductor device according to claim 1, further comprising a step of forming a buffer layer having an n-type conductivity on the oxide semiconductor film.

3. The method for manufacturing a semiconductor device according to claim 1, wherein, in the oxide insulating film, a whole region under the island-shaped oxide semiconductor film is directly in contact with the substrate.

4. The method for manufacturing a semiconductor device according to claim 1, wherein the heat treatment is performed at a temperature higher than or equal to 150°

C. and lower than a strain point of the substrate.

5. The method for manufacturing a semiconductor device according to claim 1, wherein the gate insulating film comprises silicon oxide.

6. The method for manufacturing a semiconductor device according to claim 1, wherein the semiconductor device is incorporated in one of a monitor of a computer, a digital photo frame, an e-book reader, a cellular phone, a digital camera, and a television set.

7. A method for manufacturing a semiconductor device comprising the steps of:

forming an oxide insulating film on a substrate, wherein the oxide insulating film contains oxygen with a higher proportion than a proportion of oxygen in a stoichiometric composition;

forming an oxide semiconductor film on and in contact with the oxide insulating film;

reducing hydrogen concentration of the oxide semiconductor film and diffusing oxygen contained in the oxide insulating film into the oxide semiconductor film by performing a heat treatment;

forming an island-shaped oxide semiconductor film by etching the oxide semiconductor film;

forming a gate insulating film over the island-shaped oxide semiconductor film; and

forming a gate electrode overlapping with the island-shaped oxide semiconductor film with the gate insulating film interposed therebetween,

wherein an amount of oxygen desorbed from the oxide insulating film by the heat treatment is higher than or equal to 1.0×

10²⁰ atoms/cm³.

8. The method for manufacturing a semiconductor device according to claim 7, further comprising a step of forming a buffer layer having an n-type conductivity on the oxide semiconductor film.

9. The method for manufacturing a semiconductor device according to claim 7, wherein, in the oxide insulating film, a whole region under the island-shaped oxide semiconductor film is directly in contact with the substrate.

10. The method for manufacturing a semiconductor device according to claim 7, wherein the heat treatment is performed at a temperature higher than or equal to 150°

C. and lower than a strain point of the substrate.

11. The method for manufacturing a semiconductor device according to claim 7, wherein the gate insulating film comprises silicon oxide.

12. The method for manufacturing a semiconductor device according to claim 7, wherein the semiconductor device is incorporated in one of a monitor of a computer, a digital photo frame, an e-book reader, a cellular phone, a digital camera, and a television set.

13. A method for manufacturing a semiconductor device comprising the steps of:

forming an oxide insulating film over a substrate, wherein the oxide insulating film contains oxygen with a higher proportion than a proportion of oxygen in a stoichiometric composition;

forming a first gate electrode over the oxide insulating film;

forming a first gate insulating film over the first gate electrode and the oxide insulating film;

forming an oxide semiconductor film over the first gate insulating film;

reducing hydrogen concentration and oxygen vacancies in the oxide semiconductor film by performing a heat treatment;

etching part of the oxide semiconductor film to form an island-shaped oxide semiconductor film after performing the heat treatment;

forming a second gate insulating film over the island-shaped oxide semiconductor film; and

forming a second gate electrode overlapping with the island-shaped oxide semiconductor film, the first gate insulating film, and the first gate electrode with the second gate insulating film interposed therebetween.

14. The method for manufacturing a semiconductor device according to claim 13, wherein an amount of oxygen desorbed from the oxide insulating film by the heat treatment is higher than or equal to 1.0×

10²⁰ atoms/cm³.

15. The method for manufacturing a semiconductor device according to claim 13, wherein the first gate insulating film comprises silicon oxide.

16. The method for manufacturing a semiconductor device according to claim 13, wherein the heat treatment is performed at a temperature higher than or equal to 150°

C. and lower than a strain point of the substrate.

17. The method for manufacturing a semiconductor device according to claim 13, wherein the second gate insulating film comprises silicon oxide.

18. The method for manufacturing a semiconductor device according to claim 13, wherein the semiconductor device is incorporated in one of a monitor of a computer, a digital photo frame, an e-book reader, a cellular phone, a digital camera, and a television set.