Radial waveguide systems and methods for post-match control of microwaves
First Claim
1. A system that provides post-match control of microwaves in a radial waveguide, comprising:
- the radial waveguide;
a signal generator that provides a first microwave signal and a second microwave signal, the first and second microwave signals having a common frequency, wherein the signal generator adjusts a phase offset between the first and second microwave signals in response to a digital correction signal;
a first electronics set and a second electronics set, wherein each of the first and second electronics sets;
amplifies a respective one of the first and second microwave signals to provide a respective first or second amplified microwave signal,transmits the respective one of the first and second amplified microwave signals into the radial waveguide; and
matches an impedance of the respective one of the first and second amplified microwave signals to an impedance presented by the radial waveguide;
at least two monitoring antennas disposed at least 30 degrees about a circumference of the radial waveguide from locations at which the first and second electronics sets transmit the respective first and second amplified microwave signals into the radial waveguide; and
a signal controller that;
receives analog signals from the at least two monitoring antennas;
determines the digital correction signal based at least on the analog signals from the at least two monitoring antennas; and
transmits the digital correction signal to the signal generator.
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Accused Products
Abstract
A system provides post-match control of microwaves in a radial waveguide. The system includes the radial waveguide, and a signal generator that provides first and second microwave signals that have a common frequency. The signal generator adjusts a phase offset between the first and second signals in response to a correction signal. The system also includes first and second electronics sets, each of which amplifies a respective one of the first and second microwave signals. The system transmits the amplified, first and second microwave signals into the radial waveguide, and matches an impedance of the amplified microwave signals to an impedance presented by the waveguide. The system also includes at least two monitoring antennas disposed within the waveguide. A signal controller receives analog signals from the monitoring antennas, determines the digital correction signal based at least on the analog signals, and transmits the correction signal to the signal generator.
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Citations
15 Claims
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1. A system that provides post-match control of microwaves in a radial waveguide, comprising:
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the radial waveguide; a signal generator that provides a first microwave signal and a second microwave signal, the first and second microwave signals having a common frequency, wherein the signal generator adjusts a phase offset between the first and second microwave signals in response to a digital correction signal; a first electronics set and a second electronics set, wherein each of the first and second electronics sets; amplifies a respective one of the first and second microwave signals to provide a respective first or second amplified microwave signal, transmits the respective one of the first and second amplified microwave signals into the radial waveguide; and matches an impedance of the respective one of the first and second amplified microwave signals to an impedance presented by the radial waveguide; at least two monitoring antennas disposed at least 30 degrees about a circumference of the radial waveguide from locations at which the first and second electronics sets transmit the respective first and second amplified microwave signals into the radial waveguide; and a signal controller that; receives analog signals from the at least two monitoring antennas; determines the digital correction signal based at least on the analog signals from the at least two monitoring antennas; and transmits the digital correction signal to the signal generator. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A system for plasma processing of a workpiece, comprising:
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a process chamber configured to create a plasma for the plasma processing; a radial waveguide, adjacent to the process chamber, configured to generate microwaves for transmission to the process chamber to supply energy for the plasma; a signal generator that provides a first microwave signal and a second microwave signal, the first and second microwave signals having a common frequency, wherein the signal generator adjusts a phase offset between the first and second microwave signals in response to a digital correction signal; a first electronics set and a second electronics set, wherein each of the first and second electronics sets; amplifies a respective one of the first and second microwave signals to provide an amplified microwave signal, transmits the amplified microwave signal into the radial waveguide; and matches an impedance of the amplified microwave signal to an impedance presented by the radial waveguide; at least two monitoring antennas disposed at least 30 degrees about a circumference of the radial waveguide from locations at which the first and second electronics sets transmit the respective first and second amplified microwave signals into the radial waveguide; and a signal controller that; receives analog signals from the at least two monitoring antennas; determines the digital correction signal based at least on the analog signals from the at least two monitoring antennas; and transmits the digital correction signal to the signal generator; and
wherein the first electronics set includes;a tuner that matches the impedance of the first amplified microwave signal to the impedance presented by the radial waveguide, a dummy load, and a circulator that shunts power reflected back from the radial waveguide toward the first electronics set, into the dummy load; and the signal generator adjusts the phase offset, and the tuner matches the impedance, concurrently with one another. - View Dependent Claims (8, 9)
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10. A method for controlling a plasma within a process chamber, comprising:
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generating, with a signal generator, a first microwave signal and a second microwave signal, the first and second microwave signals having a common frequency, and a phase offset therebetween that is determined at least in part by the signal generator responding to a digital correction signal; amplifying the first and second microwave signals to provide respective first and second amplified microwave signals; transmitting the first and second amplified microwave signals into a radial waveguide proximate the process chamber such that microwaves propagate from the radial waveguide into the process chamber to provide energy for the plasma; generating analog signals with at least two monitoring antennas disposed at least 30 degrees about a circumference of the radial waveguide from locations at which the first and second electronics sets transmit the respective first and second amplified microwave signals into the radial waveguide; determining the digital correction signal based at least on the analog signals from the at least two monitoring antennas; and transmitting the digital correction signal to the signal generator. - View Dependent Claims (11, 12, 13, 14, 15)
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Specification