Semiconductor device with light-blocking layers
First Claim
1. A memory device comprising:
- a memory cell comprising;
a transistor including;
an oxide semiconductor layer; and
a source electrode and a drain electrode electrically connected to the oxide semiconductor layer;
a capacitor of which one electrode is directly connected to one of the source electrode and the drain electrode; and
a light-blocking layer overlapping an entire portion of the oxide semiconductor layer, the light-blocking layer directly connected to the one of the source electrode and the drain electrode,wherein at least one of electrodes of the capacitor has a light-blocking property,wherein the oxide semiconductor layer is between the one of electrodes and the light-blocking layer, andwherein the one of electrodes is overlapped by a channel formation region of the oxide semiconductor layer in order to prevent light from entering the channel formation region.
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Accused Products
Abstract
One object is to propose a memory device in which a period in which data is held can be ensured and memory capacity per unit area can be increased. The memory device includes a memory element, a transistor including an oxide semiconductor in an active layer for control of accumulating, holding, and discharging charge in the memory element, and a capacitor connected to the memory element. At least one of a pair of electrodes of the capacitor has a light-blocking property. Further, the memory device includes a light-blocking conductive film or a light-blocking insulating film. The active layer is positioned between the electrode having a light-blocking property and the light-blocking conductive film or the light-blocking insulating film.
165 Citations
19 Claims
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1. A memory device comprising:
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a memory cell comprising; a transistor including; an oxide semiconductor layer; and a source electrode and a drain electrode electrically connected to the oxide semiconductor layer; a capacitor of which one electrode is directly connected to one of the source electrode and the drain electrode; and a light-blocking layer overlapping an entire portion of the oxide semiconductor layer, the light-blocking layer directly connected to the one of the source electrode and the drain electrode, wherein at least one of electrodes of the capacitor has a light-blocking property, wherein the oxide semiconductor layer is between the one of electrodes and the light-blocking layer, and wherein the one of electrodes is overlapped by a channel formation region of the oxide semiconductor layer in order to prevent light from entering the channel formation region. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A memory device comprising:
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a memory cell comprising; a first transistor including an oxide semiconductor layer; a second transistor including a silicon semiconductor layer; a capacitor; and a light-blocking layer, wherein the first transistor is configured to control supply of a potential to a gate electrode of the second transistor, wherein the capacitor is configured to hold the potential of the gate electrode of the second transistor, wherein at least one of electrodes of the capacitor has a light-blocking property, wherein the oxide semiconductor layer is between the one of electrodes and the light-blocking layer, wherein the light-blocking layer overlaps an entire upper surface of the oxide semiconductor layer, and wherein both electrodes of the capacitor are overlapped by an entire bottom surface of the oxide semiconductor layer in order to prevent light from entering a channel formation region of the oxide semiconductor layer. - View Dependent Claims (8, 9, 10, 11, 12, 13)
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14. A memory device comprising:
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a memory cell comprising; a transistor including an oxide semiconductor layer; a capacitor; and a light-blocking layer comprising an insulating resin, wherein charge flowing in or out of the capacitor is controlled by the transistor, wherein at least one of electrodes of the capacitor has a light-blocking property, wherein the oxide semiconductor layer is between the one of electrodes and the light-blocking layer, wherein the light-blocking layer overlaps an entire upper surface of the oxide semiconductor layer, and wherein both electrodes of the capacitor are overlapped by an entire bottom surface of the oxide semiconductor layer. - View Dependent Claims (15, 16, 17, 18, 19)
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Specification