Measurement of the position of a radiation beam spot in lithography

• US 9,304,401 B2
• Filed: 02/22/2012
• Issued: 04/05/2016
• Est. Priority Date: 03/29/2011
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Peeters, Felix Godfried Peter, Benschop, Jozef Petrus Henricus, Renkens, Michael Jozef Mathijs, Van Baars, Gregor Edward, Dekkers, Jeroen
• Primary Examiner(s): Kreutzer, Colin
• Application Number:
  US14/001,478
• Publication Number:
  US 20130335721A1
• Time in Patent Office: 1,504 Days
• Field of Search: 355/67, 355/68, 355/71, 355/72, 355/77
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70133 Measurement of illumination distribution, in pupil plane or field plane
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70375 Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
• CPC Class Codes: G03F 7/70391 Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
• CPC Class Codes: G03F 7/704 Scanned exposure beam, e.g. raster-, rotary- and vector scanning mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358
• CPC Class Codes: G03F 7/70516 Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
• CPC Class Codes: G03F 7/708 Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 9/7019 Calibration

Abstract

A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.

Claims

1. A lithographic apparatus, comprising:

a programmable patterning device, configured to provide a plurality of radiation beams;

a projection system, configured to project the plurality of radiation beams onto a substrate to form respective spots of radiation; and

a radiation spot measurement system, comprising;

a target, onto which the spots of radiation may be projected for a spot measurement process, the target comprising a plurality of measurement targets;

a radiation detector, configured to detect radiation from one of the spots of radiation that has been projected onto the measurement target;

an actuator system configured to control the position of the radiation detector relative to the plurality of measurement targets such that, at different respective positions, it can detect radiation that has been projected onto a different measurement target of the plurality of measurement targets; and

a controller, configured to receive information from the radiation detector and, based on the information, to determine at least the position of the spot of radiation relative to an intended position of the spot of radiation on the target in a plane substantially parallel to a surface of the target.

2. The lithographic apparatus according to claim 1, further comprising a substrate table configured to support a substrate, wherein the target is in or on the substrate table.

3. The lithographic apparatus according to claim 1, wherein the target is elongate and the plurality of the measurement targets are distributed along the target in its elongate direction.

4. The lithographic apparatus according to claim 1, wherein the target further comprises a radiation detector alignment marker;

and

the lithographic apparatus comprises a radiation detector alignment marker inspection system configured to inspect the radiation detector alignment marker and determine the position of the radiation detector relative to the target based on the inspection of the radiation detector alignment marker.

5. The lithographic apparatus according to claim 1, wherein the projection system comprises a moveable optical element and is configured such that, for a given position of a substrate or the target relative to the projection system, it can project each spot of radiation onto a plurality of locations on the substrate or target during the formation of an image on the substrate or the performance of a spot measurement process, respectively.

6. The lithographic apparatus according to claim 5, wherein the target, radiation detector and controller are configured to determine for a plurality of the locations, the position of the spot of radiation on the target relative to the corresponding intended position of the spot of radiation.

7. The lithographic apparatus according to claim 1, wherein the projection system comprises a plurality of units, each to project a plurality of beams of radiation onto a substrate to form respective spots of radiation;

each of the units comprises a moveable optical element and is configured such that, for a given position of a substrate or target relative to the projection system, it can project each spot of radiation onto a plurality of locations on the substrate or target during the formation of an image on the substrate or the performance of a spot measurement process, respectively; and

the lithographic apparatus comprises a respective radiation detector associated with each of the units of the projection system, each configured to detect radiation from a spot of radiation from the corresponding unit that has been projected onto a measurement target.

8. The lithographic apparatus according to claim 1, wherein the target comprises a reflective measurement target, and the radiation detector is mounted to the projection system.

9. The lithographic apparatus according to claim 1, wherein the measurement target comprises a window to permit an image of the spot of radiation to be directed to the radiation detector when the spot is projected onto the window;

the radiation detector comprises an image sensor configured to acquire an image that includes an image of the spot of radiation; and

the controller is configured to determine the position of the spot of radiation relative to an intended position of the spot of radiation based on the position of the image of the spot of radiation in the field of view of the image sensor.

10. The lithographic apparatus according to claim 9, wherein the target further comprises a radiation detector alignment marker and wherein the image acquired by the image sensor includes an image of the radiation detector alignment marker.

11. The lithographic apparatus according to claim 9, wherein the controller is configured to determine the shape of the spot of radiation based on the image of the spot of radiation acquired by the image sensor.

12. The lithographic apparatus according to claim 1, wherein:

the measurement target comprises first, second and third sections, the first and third sections each comprise a grating and the second section comprises a window configured to permit the spot of radiation to be directed to the radiation detector;

the lithographic apparatus is configured such that the spot of radiation is projected onto the measurement target such that it scans across the first, second and third sections;

the radiation detector comprises a radiation intensity sensor configured to detect the intensity of radiation from the spot directed to the radiation detector from the measurement target; and

the controller is configured to control the programmable patterning device such that the beam of radiation providing the spot of radiation has a substantially constant intensity when it scans across the first and third sections and has a varying intensity at a reference position when the spot of radiation scans across the second section, and to determine the position of the spot of radiation based on the timing and/or phase of first, second and third signals from the radiation detector that correspond to the spot of radiation being projected onto the first, second and third sections respectively.

13. The lithographic apparatus according to claim 1, wherein:

the measurement target comprises a plurality of sections, each section comprising a respective grating;

the lithographic apparatus is configured such that the spot of radiation is projected onto the measurement target such that it scans across the sections of the measurement target;

the radiation detector comprises a radiation intensity sensor configured to detect the intensity of radiation from the spot directed to the radiation detector from the measurement target;

the controller is configured to control the programmable patterning device such that the beam of radiation providing the spot of radiation has a varying intensity at a substantially constant frequency at the point at which it is projected onto the target; and

the controller is configured to determine the position of the spot of radiation relative to an intended position of the spot of radiation based on respective signals from the radiation detector corresponding to the spot of radiation being projected at the plurality of sections of the measurement target.

14. The lithographic apparatus according to claim 1, wherein:

the lithographic apparatus is configured such that the spot of radiation is projected onto the measurement target such that it is scanned across the measurement target;

the target comprises a slit configured to select a fraction of the area of the spot of radiation such that the fraction is directed to the radiation detector for each position of the spot of radiation relative to the measurement target; and

the radiation detector comprises a radiation intensity sensor to detect the intensity of radiation from the spot directed to the radiation detector from the measurement target.

15. The lithographic apparatus according to claim 14, wherein the measurement target comprises at least first and second slits arranged such that, as the spot of radiation scans across the measurement target, it successively scans across each of the slits;

and

the first and second slits are arranged at respective different oblique angles to the direction of scanning of the spot of radiation across the target.

17. The lithographic apparatus according to claim 1, further comprising a radiation detector alignment marker spatially fixed in relation to a substrate table to hold the substrate or in relation to the radiation detector, and

a radiation detector alignment marker inspection system configured to inspect the radiation detector alignment marker and determine the position of the radiation detector relative to the substrate table or an object fixed to the substrate table based on the inspection of the radiation detector alignment marker.

18. The lithographic apparatus according to claim 2, wherein the radiation detector is in or on the substrate table.

16. A method for measuring a radiation beam spot position in a lithographic apparatus that comprises a programmable patterning device to provide a plurality of radiation beams and a projection system to project the plurality of radiation beams onto a substrate to form respective spots of radiation, the method comprising:

projecting the spots of radiation onto a target comprising a plurality of measurement targets;

using a radiation detector to detect radiation from one of the spots of radiation that has been projected onto the measurement target;

controlling the position of the radiation detector, using an actuator system, relative to the plurality of measurement targets such that, at different respective positions, it can detect radiation that has been projected onto a different measurement target of the plurality of measurement targets; and

determining at least the position of the spot of radiation relative to an intended position of the spot of radiation in a plane substantially parallel to a surface of the target based on information from the radiation detector.

19. A lithographic apparatus, comprising:

a programmable patterning device, configured to provide a plurality of radiation beams;

a projection system, configured to project the plurality of radiation beams onto a substrate to form respective spots of radiation; and

a radiation spot measurement system, comprising;

a target, onto which the spots of radiation may be projected for a spot measurement process, the target comprising a measurement target, the measurement target comprising first, second and third sections, the first and third sections each comprising a grating and the second section comprising a window;

a radiation detector configured to detect radiation from one of the spots of radiation that has been projected onto the measurement target, the radiation detector comprising a radiation intensity sensor configured to detect the intensity of radiation from the spot and the window configured to permit the spot of radiation to be directed to the radiation detector; and

a control system configured to provide relative movement between the spot of radiation and the first, second and third sections such the spot scans across the first, second and third sections, configured to control the programmable patterning device such that the beam of radiation providing the spot of radiation has a substantially constant intensity when it scans across the first and third sections and has a varying intensity at a reference position when the spot of radiation scans across the second section, and configured to determine at least the position of the spot of radiation relative to an intended position of the spot of radiation on the target in a plane substantially parallel to a surface of the target based on the timing and/or phase of first, second and third signals from the radiation detector that correspond to the spot of radiation being projected onto the first, second and third sections respectively.

20. A lithographic apparatus, comprising:

a programmable patterning device, configured to provide a plurality of radiation beams;

a projection system, configured to project the plurality of radiation beams onto a substrate to form respective spots of radiation; and

a radiation spot measurement system, comprising;

a target, onto which the spots of radiation may be projected for a spot measurement process, the target comprising a measurement target, the measurement target comprising a plurality of sections, each section comprising a respective grating;

a radiation detector configured to detect radiation from one of the spots of radiation that has been projected onto the measurement target, the radiation detector comprising a radiation intensity sensor configured to detect the intensity of radiation from the spot; and

a control system configured to provide relative movement between the spot of radiation and the plurality of sections such the spot scans across the sections, configured to control the programmable patterning device such that the beam of radiation providing the spot of radiation has a varying intensity at a substantially constant frequency at the point at which it is projected onto the target, and configured to determine at least the position of the spot of radiation relative to an intended position of the spot of radiation on the target in a plane substantially parallel to a surface of the target based on respective signals from the radiation detector corresponding to the spot of radiation being projected at the plurality of sections of the measurement target.