Stress-generating structure for semiconductor-on-insulator devices

• US 9,305,999 B2
• Filed: 02/27/2013
• Issued: 04/05/2016
• Est. Priority Date: 09/25/2007
• Status: Active Grant

• Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Original Assignee: GlobalFoundries, Inc.
• Inventors: Zhu, Huilong, Greene, Brian J., Chidambarrao, Dureseti, Freeman, Gregory G.
• Primary Examiner(s): Jackson, Jr., Jerome
• Assistant Examiner(s): CHEN, DAVID Z
• Application Number:
  US13/778,419
• Publication Number:
  US 20130168804A1
• Time in Patent Office: 1,133 Days
• Field of Search: 438/311, 438/412, 438/517
• US Class Current: 1/1
• CPC Class Codes: H01L 21/76224 using trench refilling with dielectric materials trench filling with polycristalline silicon H01L21/763; together with vertical isolation, e.g. trench refilling in a SOI substrate H01L21/76264
• CPC Class Codes: H01L 29/0603 characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions isolation regions between components H01L21/76; design considerations for integrated circuits H01L27/00; geometrical design considerations for devices H01L29/0657
• CPC Class Codes: H01L 29/1025 Channel region of field-effect devices
• CPC Class Codes: H01L 29/1054 with a variation of the composition, e.g. channel with strained layer for increasing the mobility
• CPC Class Codes: H01L 29/84 controllable by variation of applied mechanical force, e.g. of pressure

Abstract

A stack pad layers including a first pad oxide layer, a pad nitride layer, and a second pad oxide layer are formed on a semiconductor-on-insulator (SOI) substrate. A deep trench extending below a top surface or a bottom surface of a buried insulator layer of the SOI substrate and enclosing at least one top semiconductor region is formed by lithographic methods and etching. A stress-generating insulator material is deposited in the deep trench and recessed below a top surface of the SOI substrate to form a stress-generating buried insulator plug in the deep trench. A silicon oxide material is deposited in the deep trench, planarized, and recessed. The stack of pad layer is removed to expose substantially coplanar top surfaces of the top semiconductor layer and of silicon oxide plugs. The stress-generating buried insulator plug encloses, and generates a stress to, the at least one top semiconductor region.

Claims

1. A method of forming a semiconductor structure comprising:

providing a semiconductor-on-insulator (SOI) substrate including a handle substrate consisting of a single crystalline semiconductor material, a buried insulating layer present on said handle substrate, and a top semiconductor layer present on said buried insulating layer;

forming a trench extending from a top surface of said SOI substrate to a depth beneath a bottom surface of said buried insulating layer of said SOI substrate to physically expose a portion of said handle substrate at a bottom of said trench, wherein said trench laterally abuts and encloses at least one top semiconductor portion formed in said top semiconductor layer of said SOI substrate; and

forming a stack of an insulator stressor plug and a silicon oxide plug in said trench, wherein said insulator stressor plug abuts said portion of said handle substrate exposed at said bottom of said trench, wherein said silicon oxide plug is substantially coplanar with a top surface of said at least one top semiconductor portion and has sidewalls in direct contact with sidewalls of said trench, and wherein an interface between said insulator stressor plug and said silicon oxide plug is coplanar with said bottom surface of said buried insulating layer.

2. The method of claim 1, further comprising:

forming a stack of pad layers directly on said SOI substrate;

applying a photoresist on said stack of pad layers and lithographically patterning said photoresist; and

transferring a pattern in said photoresist into said stack of pad layers and said SOI substrate by at least one reactive etch.

3. The method of claim 1, wherein said insulator stressor plug comprises a silicon nitride.

4. The method of claim 3, wherein the insulator stressor plug applies a compressive stress or a tensile stress to said at least one top semiconductor portion.

5. The method of claim 3, wherein said insulator stressor plug is formed by a deposition process selected from the group consisting of plasma enhanced chemical vapor deposition (PECVD), high density plasma chemical vapor deposition (HDPCVD), rapid thermal chemical vapor deposition (RTCVD), low pressure chemical vapor deposition (LPCVD), and a combination thereof.

6. The method of claim 1, wherein said forming said stack of said insulator stressor plug and said silicon oxide plug in said trench comprises:

depositing a stress-generating material into said trench;

recessing said stress-generating material in said trench to form said insulator stressor plug;

depositing a silicon oxide into said trench on top of said insulator stressor plug; and

recessing said silicon oxide in said trench to form said silicon oxide plug.

7. The method of claim 6, wherein said recessing of said silicon oxide comprises reactive ion etching (RIE).

8. The method of claim 1, wherein a thickness of said at least one top semiconductor portion is from about 5 nm to about 300 nm.

9. The method of claim 8, wherein a depth of said trench is from about 200 nm to about 8,000 nm.

10. A method of forming a semiconductor structure comprising:

providing a semiconductor-on-insulator (SOI) substrate including a handle substrate consisting of a single crystalline semiconductor material, a buried insulator layer present on said handle substrate, and a top semiconductor layer present on said buried insulator layer;

forming a trench extending from a top surface of said top semiconductor layer of said SOI substrate into said handle substrate of said SOI substrate, wherein said trench laterally abuts and encloses at least one top semiconductor portion formed in said top semiconductor layer of said SOI substrate;

depositing a silicon nitride into said trench to completely fill said trench;

recessing said silicon nitride in said trench such that a top surface of said silicon nitride is coplanar with a bottom surface of said buried insulator layer to form an insulator stressor plug, said insulator stressor plug spanning an entire width of said trench; and

forming a silicon oxide plug over said insulator stressor plug in said trench, said silicon oxide plug having a top surface substantially coplanar with said top surface of said top semiconductor layer.

11. The method of claim 10, wherein said insulator stressor plug applies a compressive stress or a tensile stress to said at least one top semiconductor portion.

12. The method of claim 10, wherein said insulator stressor plug is formed by a deposition process selected from the group consisting of plasma enhanced chemical vapor deposition (PECVD), high density plasma chemical vapor deposition (HDPCVD), rapid thermal chemical vapor deposition (RTCVD), low pressure chemical vapor deposition (LPCVD), and a combination thereof.

13. The method of claim 10, wherein a thickness of said at least one top semiconductor portion is from about 5 nm to about 300 nm.

14. The method of claim 10, wherein a depth of said trench is from about 200 nm to about 8,000 nm.