Electro-optical modulator with a vertical capacitor structure

• US 9,310,629 B2
• Filed: 04/30/2014
• Issued: 04/12/2016
• Est. Priority Date: 01/24/2014
• Status: Active Grant

• Current Assignee: Cisco Technology, Inc. (Cisco Systems, Inc.)
• Original Assignee: Cisco Technology, Inc. (Cisco Systems, Inc.)
• Inventors: Patel, Vipulkumar, Gothoskar, Prakash
• Primary Examiner(s): LEPISTO, RYAN A
• Application Number:
  US14/266,397
• Publication Number:
  US 20150212386A1
• Time in Patent Office: 713 Days
• Field of Search: 385 1- 3
• US Class Current: 1/1
• CPC Class Codes: G02B 6/132 by deposition of thin films
• CPC Class Codes: G02B 6/136 by etching
• CPC Class Codes: G02F 1/011 in optical waveguides, not otherwise provided for in this subclass
• CPC Class Codes: G02F 1/0152 using free carrier effects, e.g. plasma effect
• CPC Class Codes: G02F 1/025 in an optical waveguide structure G02F1/017, G02F1/2257 take precedence
• CPC Class Codes: G02F 1/2257 the optical waveguides being made of semiconducting material
• CPC Class Codes: Y10S 977/834 Optical properties of nanomaterial, e.g. specified transparency, opacity, or index of refraction

Abstract

An optical modulator may include a leftmost waveguide, a rightmost waveguide, and a dielectric layer disposed therebetween. In one embodiment, the waveguides may be disposed on the same plane. When a voltage potential is created between the rightmost and leftmost waveguides, these layers form a silicon-insulator-silicon capacitor (also referred to as SISCAP) structure that provides efficient, high-speed optical modulation of an optical signal passing through the modulator. As opposed to a horizontal SISCAP structure where the dielectric layer is disposed between upper and lower waveguides, arranging the dielectric layer between waveguides disposed on the same plane results in a vertical SISCAP structure. In one embodiment, the leftmost and rightmost waveguide are both made from crystalline silicon.

Claims

1. An optical device, comprising:

a right crystalline silicon waveguide disposed on a dielectric substrate;

a left crystalline silicon waveguide disposed on the dielectric substrate, wherein the right and left waveguides are disposed on a same plane defined by the dielectric substrate, and wherein the right and left waveguides have respective, opposing first and second sides; and

a vertical region separating the right and left waveguides, the vertical region extending vertically from the dielectric substrate to an upper surface of one of the right and left waveguides opposite a lower surface contacting the dielectric substrate, wherein the vertical region is filled with a dielectric material contacting the respective first sides of the left and right waveguides,

wherein the left and right waveguides comprise respective raised wing portions that extend in a direction away from the dielectric substrate, the wing portions are located at the respective second sides of the left and right waveguides,

wherein the left waveguide is doped a first conductivity type and the right waveguide is doped a second, different conductivity type.

2. The optical device of claim 1, wherein the vertical region has a width that is less than 15 nanometers.

3. The optical device of claim 1, wherein a first electrical connection is coupled to an upper surface of the wing portion of the left waveguide and a second electrical connection is coupled to an upper surface of the wing portion of the right waveguide.

4. The optical device of claim 1, wherein the respective wing portions are more heavily doped with the first and second conductivity types, respectively, relative to remaining portions of the left and right waveguides.

5. The optical device of claim 1, wherein a dielectric ridge at least partially overlaps the vertical region, wherein a width of the dielectric ridge is equal to or greater than a width of the vertical region.

6. The optical device of claim 5, wherein the dielectric ridge comprises silicon nitride.

7. An optical device, comprising:

a right waveguide disposed on a dielectric substrate;

a left waveguide disposed on the dielectric substrate, wherein the right and left waveguides are disposed on a same plane defined by the dielectric substrate, wherein the left waveguide is doped a first conductivity type and the right waveguide is doped a second, different conductivity type, and wherein the right and left waveguides have respective, opposing first and second sides;

a vertical region separating the right and left waveguides, the vertical region extending vertically from the dielectric substrate to an upper surface of one of the right and left waveguides opposite a lower surface contacting the dielectric substrate, wherein the vertical region is filled with a dielectric material contacting the respective first sides of the left and right wavequides, wherein the left and right wavequides comprise respective raised wing portions that extend in a direction away from the dielectric substrate, the wing portions are located at the respective second sides of the left and right waveguides; and

a dielectric ridge at least partially overlapping the vertical region, wherein a width of the dielectric ridge is equal to or greater than a width of the vertical region.

8. The optical device of claim 7, wherein the vertical region has a width that is less than 15 nanometers.

9. The optical device of claim 7, further comprising a dielectric capping layer at least partially overlapping the left and right waveguides, wherein the dielectric ridge is a feature of the dielectric capping layer.

10. The optical device of claim 7, wherein the dielectric ridge comprises silicon nitride.