Organometallic solution based high resolution patterning compositions
DCFirst Claim
1. A method for patterning a substrate with radiation, the method comprising:
- irradiating a coated substrate along a selected pattern to form an irradiated structure with a region of irradiated coating and a region with un-irradiated coating, wherein the coated substrate comprises a coating having an average thickness from about 5 nm to about 200 nm and that comprises a metal oxo-hydroxo network with organic ligands with metal carbon bonds and/or with metal carboxylate bonds and free of peroxide ligands;
heating the irradiated structure at a temperature from about 45°
C. to about 250°
C. for 0.1 minutes to about 30 minutes to form an annealed irradiated structure; and
selectively developing the annealed irradiated structure to remove a substantial portion of the irradiated coating or of the un-irradiated coating to form a patterned substratewherein the metal oxo-hydroxo network comprises both M-O—
H linkages and M-O-M linkages.
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Abstract
Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
296 Citations
29 Claims
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1. A method for patterning a substrate with radiation, the method comprising:
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irradiating a coated substrate along a selected pattern to form an irradiated structure with a region of irradiated coating and a region with un-irradiated coating, wherein the coated substrate comprises a coating having an average thickness from about 5 nm to about 200 nm and that comprises a metal oxo-hydroxo network with organic ligands with metal carbon bonds and/or with metal carboxylate bonds and free of peroxide ligands; heating the irradiated structure at a temperature from about 45°
C. to about 250°
C. for 0.1 minutes to about 30 minutes to form an annealed irradiated structure; andselectively developing the annealed irradiated structure to remove a substantial portion of the irradiated coating or of the un-irradiated coating to form a patterned substrate wherein the metal oxo-hydroxo network comprises both M-O—
H linkages and M-O-M linkages. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A coated substrate comprising a radiation sensitive coating having an average thickness from about 5 nm to about 200 nm and a thickness variation of no more than about 50% from the average at any point along the coating, the coating comprising a metal oxo-hydroxo network with metal cations having organic ligands with metal carbon bonds and/or with metal carboxylate bonds, wherein the oxo-hydroxo network has both M-O—
- H linkages and M-O-M linkages.
- View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A patterned substrate comprising a substrate with a surface and a first coating at selected regions along the surface and absent at other regions along the surface, the first coating comprising a metal oxo-hydroxo network and organic ligands with metal cations having organic ligands with metal carbon bonds and/or with metal carboxylate bonds, wherein the oxo-hydroxo network has both M-O—
- H linkages and M-O-M linkages, wherein alternatively the first coating is soluble in at least some organic liquids or the first coating is soluble in aqueous bases.
- View Dependent Claims (21, 22, 23, 24, 25, 26)
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27. A precursor solution comprising an organic liquid and from about 0.01M to about 1.4M metal polynuclear oxo/hydroxo cation with organic ligands having metal carbon bonds and/or with metal carboxylate bonds, wherein the metal polynuclear oxo/hydroxo cation with organic ligands forms an oxo-hydroxo network, wherein the oxo-hydroxo network has both M-O—
- H linkages and M-O-M linkages, the precursor solution having a viscosity from about 0.5 centipoises (cP) to about 150 cP and the organic liquid having a flash point of at least 10°
C. and a vapor pressure at 20°
C. less than about 10 kPa. - View Dependent Claims (28, 29)
- H linkages and M-O-M linkages, the precursor solution having a viscosity from about 0.5 centipoises (cP) to about 150 cP and the organic liquid having a flash point of at least 10°
Specification