Method for producing display panel, and display panel
First Claim
1. A transistor array comprising:
- a base substrate;
a gate electrode located on an upper surface of the base substrate;
a gate insulating film located on the base substrate and having a first opening therein at a position overlapping with the gate electrode in plan-view;
a bank layer located on the gate insulating film and having a second opening therein at a position overlapping with the first opening in plan-view, the second opening having a smaller area than the first opening in plan-view; and
a wiring layer located in the first opening and the second opening, in contact with the gate electrode, whereinthe bank layer includes a portion located on an upper surface of the gate insulating film and a portion located in the first opening, andthe portion of the bank layer located in the first opening covers an internal side surface of the gate insulating film located around the first opening.
5 Assignments
0 Petitions
Accused Products
Abstract
In a method for producing a display panel, a base substrate having an upper surface on which an electrode is located is prepared. A first layer having a first opening overlapping with the electrode in plan-view is formed on the base substrate. A second layer having a second opening overlapping with the first opening in plan-view is formed on the first layer. The second opening has a smaller area than the first opening in plan-view. A wiring layer is formed in the first opening and the second opening, in contact with the electrode. The second layer includes a portion located on an upper surface of the first layer and a portion located in the first opening. The portion of the second layer located in the first opening covers an internal side surface of the first layer located around the first opening.
14 Citations
20 Claims
-
1. A transistor array comprising:
-
a base substrate; a gate electrode located on an upper surface of the base substrate; a gate insulating film located on the base substrate and having a first opening therein at a position overlapping with the gate electrode in plan-view; a bank layer located on the gate insulating film and having a second opening therein at a position overlapping with the first opening in plan-view, the second opening having a smaller area than the first opening in plan-view; and a wiring layer located in the first opening and the second opening, in contact with the gate electrode, wherein the bank layer includes a portion located on an upper surface of the gate insulating film and a portion located in the first opening, and the portion of the bank layer located in the first opening covers an internal side surface of the gate insulating film located around the first opening. - View Dependent Claims (2, 3, 4, 16, 17, 18, 19, 20)
-
-
5. A display panel comprising:
-
a base substrate; a gate electrode located on an upper surface of the base substrate; a gate insulating film located on the base substrate and having a first opening therein at a position overlapping with the gate electrode in plan-view; a bank layer located on the gate insulating film and having a second opening therein at a position overlapping with the first opening in plan-view, the second opening having a smaller area than the first opening in plan-view; and a wiring layer located in the first opening and the second opening, in contact with the gate electrode, wherein the bank layer includes a portion located on an upper surface of the gate insulating film and a portion located in the first opening, and the portion of the bank layer located in the first opening covers an internal side surface of the gate insulating film located around the first opening. - View Dependent Claims (6, 7, 8)
-
-
9. A method for producing a transistor array, comprising:
-
preparing a base substrate having an upper surface on which a gate electrode is located; forming a gate insulating film on the base substrate such that the gate insulating film has a first opening therein at a position overlapping with the gate electrode in plan-view; forming a bank layer on the gate insulating film such that the bank layer has a second opening therein at a position overlapping with the first opening in plan-view, the second opening having a smaller area than the first opening in plan-view; and forming a wiring layer in the first opening and the second opening such that the wiring layer is in contact with the gate electrode, wherein the bank layer includes a portion located on an upper surface of the gate insulating film and a portion located in the first opening, and the portion of the bank layer located in the first opening covers an internal side surface of the gate insulating film located around the first opening. - View Dependent Claims (10, 11, 12, 13, 14)
-
-
15. A method for producing a display panel, comprising:
-
preparing a base substrate having an upper surface on which a gate electrode is located; forming a gate insulating film on the base substrate such that the gate insulating film has a first opening therein at a position overlapping with the gate electrode in plan-view; forming a bank layer on the gate insulating film such that the bank layer has a second opening therein at a position overlapping with the first opening in plan-view, the second opening having a smaller area than the first opening in plan-view; and forming a wiring layer in the first opening and the second opening such that the wiring layer is in contact with the gate electrode, wherein the bank layer includes a portion located on an upper surface of the gate insulating film and a portion located in the first opening, and the portion of the bank layer located in the first opening covers an internal side surface of the gate insulating film located around the first opening.
-
Specification