FinFET with epitaxial source and drain regions and dielectric isolated channel region
First Claim
1. A structure comprising:
- a pedestal of an insulating material present over at least one layer of a semiconductor material that includes a punch through barrier layer and a semiconductor substrate, wherein the punch-through layer is present between the pedestal of the insulating material and the semiconductor substrate;
at least one fin structure in contact with the pedestal of the insulating material;
source and drain region structures on opposing sides of the at least one fin structure, at least one of the source and drain region structures comprising at least two epitaxial material layers, wherein a first epitaxial material layer of the at least two epitaxial layers is in contact with the punch through barrier layer of the at least one layer of semiconductor material, and a second epitaxial material layer of the at least two epitaxial layers is in contact with the at least one fin structure, the first epitaxial material layer being separated from the at least one fin structure by the second epitaxial material layer; and
a gate structure present on the at least one fin structure.
1 Assignment
0 Petitions
Accused Products
Abstract
A semiconductor device is provided that includes a pedestal of an insulating material present over at least one layer of a semiconductor material, and at least one fin structure in contact with the pedestal of the insulating material. Source and drain region structures are present on opposing sides of the at least one fin structure. At least one of the source and drain region structures includes at least two epitaxial material layers. A first epitaxial material layer is in contact with the at least one layer of semiconductor material. A second epitaxial material layer is in contact with the at least one fin structure. The first epitaxial material layer is separated from the at least one fin structure by the second epitaxial material layer. A gate structure present on the at least one fin structure.
41 Citations
19 Claims
-
1. A structure comprising:
-
a pedestal of an insulating material present over at least one layer of a semiconductor material that includes a punch through barrier layer and a semiconductor substrate, wherein the punch-through layer is present between the pedestal of the insulating material and the semiconductor substrate; at least one fin structure in contact with the pedestal of the insulating material; source and drain region structures on opposing sides of the at least one fin structure, at least one of the source and drain region structures comprising at least two epitaxial material layers, wherein a first epitaxial material layer of the at least two epitaxial layers is in contact with the punch through barrier layer of the at least one layer of semiconductor material, and a second epitaxial material layer of the at least two epitaxial layers is in contact with the at least one fin structure, the first epitaxial material layer being separated from the at least one fin structure by the second epitaxial material layer; and a gate structure present on the at least one fin structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. A method comprising:
-
providing at least one fin structure over a stacked structure of an insulator layer that is present over at least one semiconductor layer; providing a gate structure on a channel region portion of the at least one fin structure; removing exposed portions of the at least one fin structure; forming a sacrificial spacer on a sidewall of the gate structure; removing exposed portions of the insulator layer to provide a pedestal of insulating material exposing a portion of at least one semiconductor layer; forming a first epitaxial material layer on the portion of the at least one semiconductor layer exposed by removing the exposed portions of the insulator layer, the first epitaxial material layer contacting the sacrificial spacer; removing the sacrificial spacer; and forming a second epitaxial material layer in a space provided by said removing of the sacrificial spacer, the second epitaxial material layer contacting a sidewall of the at least one fin structure, wherein the first and second epitaxial material layers provide source and drain regions on opposing sides of the channel region portion of the at least one fin structure. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
-
Specification