Semiconductor light emitting device and manufacturing method thereof
First Claim
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1. A method of manufacturing a semiconductor light emitting device, comprising:
- performing epitaxial growth of a nitride multilayer film on an upper surface of a first substrate;
forming a light emitting layer including a nitride semiconductor on an upper surface of the nitride multilayer film;
joining a second substrate to an upper surface of a first laminate that includes the first substrate, the nitride multilayer film and the light emitting layer; and
removing the first substrate to expose a lower surface of the nitride multilayer film, the nitride multilayer film being at an exposed surface of a second laminate that includes the second substrate, the light emitting layer, and the nitride multilayer film forming an antireflection layer for light emitted from the light emitting layer,wherein the epitaxial growth of the nitride multilayer film is performed by forming a first layer including a first nitride semiconductor containing aluminum, forming a second layer including a second nitride semiconductor with a refractive index different from the refractive index of the first nitride semiconductor, and forming a third layer including the first nitride semiconductor containing aluminum.
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Abstract
A semiconductor light emitting device includes a supporting substrate, a light emitting layer including a nitride semiconductor, and a nitride multilayer film. The nitride multilayer film includes a first layer including a first nitride semiconductor containing aluminum nitride, a second layer including a second nitride semiconductor containing gallium nitride, and a third layer including the first nitride semiconductor containing aluminum nitride.
92 Citations
20 Claims
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1. A method of manufacturing a semiconductor light emitting device, comprising:
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performing epitaxial growth of a nitride multilayer film on an upper surface of a first substrate; forming a light emitting layer including a nitride semiconductor on an upper surface of the nitride multilayer film; joining a second substrate to an upper surface of a first laminate that includes the first substrate, the nitride multilayer film and the light emitting layer; and removing the first substrate to expose a lower surface of the nitride multilayer film, the nitride multilayer film being at an exposed surface of a second laminate that includes the second substrate, the light emitting layer, and the nitride multilayer film forming an antireflection layer for light emitted from the light emitting layer, wherein the epitaxial growth of the nitride multilayer film is performed by forming a first layer including a first nitride semiconductor containing aluminum, forming a second layer including a second nitride semiconductor with a refractive index different from the refractive index of the first nitride semiconductor, and forming a third layer including the first nitride semiconductor containing aluminum. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A semiconductor light emitting device, comprising:
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a substrate; a light emitting layer including a nitride semiconductor formed on a surface of the substrate; and a nitride multilayer film formed on the light emitting layer, the light emitting layer being between the surface of the substrate and the nitride multilayer film, wherein the nitride multilayer film is formed from a first layer including a first nitride semiconductor containing aluminum, a second layer including a second nitride semiconductor having a refractive index different from the refractive index of the first nitride semiconductor, and a third layer including the first nitride semiconductor containing aluminum, such that the nitride multilayer film includes laminated k pairs of the first layer and the second layer, where k is an integer of 1 or more, and the third layer disposed on a side of the nitride multilayer film apart from the light emitting layer, and wherein, when a thickness of the pair is t, a thickness of the third layer is t3, a wavelength of a light emitted from the light emitting layer is λ
, a refractive index of the first nitride semiconductor is n1, and a refractive index of the second nitride semiconductor is n2, the following equations are satisfied;
t=λ
/4n1+λ
/4n2, and
t3=λ
/4n1. - View Dependent Claims (9, 10, 11, 12, 13)
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14. A method of manufacturing a semiconductor light emitting device, comprising:
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bonding a first laminate including a semiconductor substrate, a nitride multilayer film formed on an upper surface of the semiconductor substrate, and a light emitting layer formed on an upper surface of the nitride multilayer film to a supporting substrate, the light emitting layer being between the supporting substrate and the nitride multilayer film; and removing the semiconductor substrate to expose a lower surface of the nitride multilayer film, the nitride multilayer film being at an exposed surface of a second laminate that includes the supporting substrate, the light emitting layer, and the nitride multilayer film forming an antireflection layer for light emitted from the light emitting layer, wherein the nitride multilayer film is formed from a first layer including a first nitride semiconductor containing aluminum, a second layer including a second nitride semiconductor having a refractive index different from the refractive index of the first nitride semiconductor, and a third layer including the first nitride semiconductor containing aluminum, such that the nitride multilayer film includes laminated k pairs of the first layer and the second layer, where k is an integer of 1 or more, and the third layer disposed on a side of the nitride multilayer film apart from the light emitting layer. - View Dependent Claims (15, 16, 17, 18, 19)
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20. A semiconductor light emitting device, comprising:
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a substrate; a light emitting layer including a nitride semiconductor formed on a surface of the substrate; a nitride multilayer film formed on the light emitting layer, the light emitting layer being between the surface of the substrate and the nitride multilayer film; a gallium nitride layer between the light emitting layer and the nitride multilayer film; and a super lattice layer including GaN and InGaN, between the light emitting layer and the gallium nitride layer, wherein the nitride multilayer film is formed from a first layer including a first nitride semiconductor containing aluminum, a second layer including a second nitride semiconductor having a refractive index different from the refractive index of the first nitride semiconductor, and a third layer including the first nitride semiconductor containing aluminum, such that the nitride multilayer film includes laminated k pairs of the first layer and the second layer, where k is an integer of 1 or more, and the third layer disposed on a side of the nitride multilayer film apart from the light emitting layer.
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Specification