Lithographic apparatus and device manufacturing method

• US 9,316,926 B2
• Filed: 11/15/2011
• Issued: 04/19/2016
• Est. Priority Date: 12/08/2010
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Zwet, Erwin John, De Jager, Pieter Willem Herman, Onvlee, Johannes, De Man, Hendrik
• Primary Examiner(s): Ton, Toan
• Assistant Examiner(s): Iacoletti, Michelle M
• Application Number:
  US13/885,960
• Publication Number:
  US 20130250267A1
• Time in Patent Office: 1,617 Days
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70216 Mask projection systems
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70266 Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70375 Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
• CPC Class Codes: G03F 7/70383 Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams maskless lithography using a programmable mask G03F7/70291
• CPC Class Codes: G03F 7/70391 Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
• CPC Class Codes: G03F 7/704 Scanned exposure beam, e.g. raster-, rotary- and vector scanning mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358
• CPC Class Codes: G03F 7/70641 Focus

Abstract

A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.

Claims

1. A lithographic apparatus having at least one optical column, the optical column comprising:

a programmable patterning device configured to provide a plurality of radiation beams;

a projection system configured to project the plurality of beams onto a substrate, the projection system comprising a plurality of lenses;

a first actuator system, configured to move at least one of the lenses in a direction perpendicular to the optical axis of the projection system to scan the plurality of beams over a target portion of the substrate;

a radiation beam expander, configured to project an image of the programmable patterning device onto the at least one lens;

a second actuator system, configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system; and

a control system configured to control the second actuator system in order to control a focus between the substrate and the at least one lens to a certain position.

2. The lithographic apparatus according to claim 1, wherein the radiation beam expander comprises a pair of axially aligned positive lenses arranged at a fixed separation.

3. The lithographic apparatus according to claim 1, wherein the radiation beam expander is configured to be both object-space telecentric and image-space telecentric.

4. The lithographic apparatus according to claim 1, wherein the at least one lens onto which the radiation beam expander projects the image of the programmable patterning device is a field lens;

the projection system further comprises an imaging lens, arranged such that the image projected onto the field lens is projected onto the substrate; and

the positions of the field lens and the imaging lens are fixed relative to each other and can be moved by the first actuator system.

5. The lithographic apparatus according to claim 4, wherein the field lens and the imaging lens are mounted to a frame rotatable about an axis parallel to the optical axis of the projection system.

6. The lithographic apparatus according to claim 1, wherein the second actuator system is configured to prevent movement of the radiation beam expander in a direction perpendicular to the optical axis of the projection system while moving the radiation beam expander in the direction parallel to the optical axis of the projection system.

7. The lithographic apparatus according to claim 1, wherein the control system is further configured to:

receive a signal relating to a focus displacement at the substrate;

convert the signal to a displacement of the radiation beam expander, based on a multiple of the focus displacement at the substrate; and

output a signal to the second actuator system to effect the displacement of the radiation beam expander.

8. The lithographic apparatus according to claim 7, wherein the multiple is

B²/(A²−

1)

in which A is the magnification of the radiation beam expander and B is the magnification of the optical system from the at least one lens onto which the radiation beam expander projects an image of the programmable patterning device to the substrate.

9. The lithographic apparatus according to claim 1 having at least a second optical column comprising:

a second programmable patterning device configured to provide a second plurality of radiation beams; and

a second projection system configured to project the second plurality of beams onto the substrate, the second projection system comprising a second plurality of lenses;

a third actuator system, configured to move at least one of the second plurality of lenses of the second projection system in a direction perpendicular to the optical axis of the second projection system to scan the second plurality of beams over a target portion of the substrate;

a second radiation beam expander, configured to project an image of the second programmable patterning device onto the at least one lens of the second plurality of lenses of the second projection system; and

a fourth actuator system, configured to move the second radiation beam expander in a direction parallel to the optical axis of the second projection system.

10. A device manufacturing method, comprising:

creating a pattern on a target portion of a substrate using at least one optical column having a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams onto the target portion, the projection system comprising a plurality of lenses;

moving at least one of the lenses in a direction perpendicular to the optical axis of the projection system to scan the plurality of beams over the target portion;

using a radiation beam expander to project an image of the programmable patterning device onto the at least one lens; and

controlling the position of the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control focus of the image formed on the substrate to a certain position.

11. The method according to claim 10, wherein the radiation beam expander comprises a pair of axially aligned positive lenses arranged at a fixed separation.

12. The method according to claim 10, wherein the radiation beam expander is configured to be both object-space telecentric and image-space telecentric.

13. The method according to claim 10, wherein the at least one lens onto which the radiation beam expander projects the image of the programmable patterning device is a field lens;

and the method further comprises;

projecting the image, projected onto the field lens, onto the substrate using an imaging lens of the projection system; and

moving the field lens and the imaging lens where the positions of the field lens and the imaging lens are fixed relative to each other.

14. The method according to claim 13, wherein the field lens and the imaging lens are mounted to a frame and the method further comprises rotating the frame about an axis parallel to the optical axis of the projection system.

15. The method according to claim 10, further comprising preventing movement of the radiation beam expander in a direction perpendicular to the optical axis of the projection system while moving the radiation beam expander in the direction parallel to the optical axis of the projection system.

16. The method according to claim 10, further comprising:

receiving a signal relating to a focus displacement at the substrate;

converting the signal to a displacement of the radiation beam expander, based on a multiple of the focus displacement at the substrate; and

effecting the displacement of the radiation beam expander.

17. The method according to claim 16, wherein the multiple is

B²/(A²−

1)

in which A is the magnification of the radiation beam expander and B is the magnification of the optical system from the at least one lens onto which the radiation beam expander projects an image of the programmable patterning device to the substrate.

18. The method according to claim 10, further comprising:

creating a pattern on the substrate using at least a second optical column having a second programmable patterning device configured to provide a second plurality of radiation beams and a second projection system configured to project the second plurality of beams onto the substrate, the second projection system comprising a second plurality of lenses;

moving at least one of the second plurality of lenses in a direction perpendicular to the optical axis of the second projection system to scan the second plurality of beams over the substrate;

using a second radiation beam expander to project an image of the second programmable patterning device onto the at least one lens of the second plurality of lenses; and

controlling the position of the second radiation beam expander in a direction parallel to the optical axis of the second projection system.