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Lithographic apparatus and device manufacturing method

  • US 9,316,926 B2
  • Filed: 11/15/2011
  • Issued: 04/19/2016
  • Est. Priority Date: 12/08/2010
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus having at least one optical column, the optical column comprising:

  • a programmable patterning device configured to provide a plurality of radiation beams;

    a projection system configured to project the plurality of beams onto a substrate, the projection system comprising a plurality of lenses;

    a first actuator system, configured to move at least one of the lenses in a direction perpendicular to the optical axis of the projection system to scan the plurality of beams over a target portion of the substrate;

    a radiation beam expander, configured to project an image of the programmable patterning device onto the at least one lens;

    a second actuator system, configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system; and

    a control system configured to control the second actuator system in order to control a focus between the substrate and the at least one lens to a certain position.

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