Semiconductor device and manufacturing method thereof
First Claim
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1. A semiconductor device comprising:
- an oxide semiconductor layer including a crystalline region over a substrate;
a source electrode layer and a drain electrode layer electrically connected to the oxide semiconductor layer; and
a gate electrode layer over the oxide semiconductor layer,wherein the crystalline region includes a crystal whose c-axis is aligned in a direction within ±
10°
from a perpendicular direction to a surface of the oxide semiconductor layer.
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Abstract
A semiconductor device includes an oxide semiconductor layer including a crystalline region over an insulating surface, a source electrode layer and a drain electrode layer in contact with the oxide semiconductor layer, a gate insulating layer covering the oxide semiconductor layer, the source electrode layer, and the drain electrode layer, and a gate electrode layer over the gate insulating layer in a region overlapping with the crystalline region. The crystalline region includes a crystal whose c-axis is aligned in a direction substantially perpendicular to a surface of the oxide semiconductor layer.
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Citations
14 Claims
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1. A semiconductor device comprising:
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an oxide semiconductor layer including a crystalline region over a substrate; a source electrode layer and a drain electrode layer electrically connected to the oxide semiconductor layer; and a gate electrode layer over the oxide semiconductor layer, wherein the crystalline region includes a crystal whose c-axis is aligned in a direction within ±
10°
from a perpendicular direction to a surface of the oxide semiconductor layer. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A semiconductor device comprising:
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an oxide semiconductor layer including a crystalline region over a substrate; a source electrode layer and a drain electrode layer electrically connected to the oxide semiconductor layer; and a gate electrode layer over the oxide semiconductor layer, wherein the crystalline region includes a crystal whose c-axis is aligned in a direction within ±
10°
from a perpendicular direction to a surface of the oxide semiconductor layer, andwherein a thickness of the crystalline region is 2 nm to 10 nm. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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Specification