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Prognostic circuit of electromigration failure for integrated circuit

  • US 9,329,228 B2
  • Filed: 06/08/2013
  • Issued: 05/03/2016
  • Est. Priority Date: 12/20/2012
  • Status: Active Grant
First Claim
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1. A prognostic circuit of electromigration (EM) failure for integrated circuit (IC), comprising a current monitoring module, wherein the current monitoring module comprises a current output module electrically connected with a monitoring metal wire, and one or more conductive metals covered by an oxide layer of the integrated circuit and electrically insulated with the monitoring metal wire, the current output module includes at least one current source, the one or more conductive metals are electrically connected with the output port of the current monitoring module, the monitoring metal wire is surrounded by the one or more conductive metals and the one or more conductive metals comprises a first metal provided on top of the monitoring metal wire, a second metal provided on the bottom of the monitoring metal wire and a third metal respectively provided on the two sides of the monitoring metal wire, and the first metal, the second metal and the third metal are electrically interconnected by a plurality of through-hole metals passing through the oxide layer.

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