Method and apparatus for dummy cell placement management
First Claim
1. A method for manipulating a circuit design comprising:
- receiving a plurality of dummy cell modification parameters;
selecting, by a computer processor and based on the plurality of dummy cell modification parameters, a dummy cell insertion region on the circuit design;
generating, in the dummy cell insertion region, a plurality of dummy cells;
selecting a first dummy cell from the plurality of dummy cells;
determining, by the computer processor and based on a location of the first dummy cell, an illegal overlap with the first dummy cell;
removing, by the computer processor in response to determining the illegal overlap and from the plurality of dummy cells, the first dummy cell;
inserting, by the computer processor, on the circuit design, and after removing the first dummy cell, the plurality of dummy cells to obtain a modified circuit design; and
presenting the modified circuit design to manufacture a semiconductor wafer, wherein device degradation is reduced during manufacturing of the semiconductor wafer.
1 Assignment
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Accused Products
Abstract
A method for manipulating a circuit design includes receiving multiple dummy cell modification parameters, selecting, by a computer processor and based on the dummy cell modification parameters, a dummy cell insertion region on a circuit design, and generating, in the dummy cell insertion region, multiple dummy cells. The method further includes selecting a first dummy cell from the dummy cells, determining, by the computer processor and based on a location of the first dummy cell, an illegal overlap with the first dummy cell, and removing, by the computer processor and from the dummy cells, the first dummy cell. The method further includes inserting, by the computer processor, on the circuit design, and after removing the first dummy cell, the dummy cells to obtain a modified circuit design, and presenting the modified circuit design.
57 Citations
20 Claims
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1. A method for manipulating a circuit design comprising:
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receiving a plurality of dummy cell modification parameters; selecting, by a computer processor and based on the plurality of dummy cell modification parameters, a dummy cell insertion region on the circuit design; generating, in the dummy cell insertion region, a plurality of dummy cells; selecting a first dummy cell from the plurality of dummy cells; determining, by the computer processor and based on a location of the first dummy cell, an illegal overlap with the first dummy cell; removing, by the computer processor in response to determining the illegal overlap and from the plurality of dummy cells, the first dummy cell; inserting, by the computer processor, on the circuit design, and after removing the first dummy cell, the plurality of dummy cells to obtain a modified circuit design; and presenting the modified circuit design to manufacture a semiconductor wafer, wherein device degradation is reduced during manufacturing of the semiconductor wafer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A system for manipulating a circuit design comprising:
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a data repository for storing the circuit design; a computer processor; a dummy cell manager executing on the computer processor for causing the computer processor to; select, based on a plurality of dummy cell modification parameters, a dummy cell insertion region on the circuit design, generate, in the dummy cell insertion region, a plurality of dummy cells; select a first dummy cell from the plurality of dummy cells, determine, based on a location of the first dummy cell, an illegal overlap with the first dummy cell, remove, in response to determining the illegal overlap and from the plurality of dummy cells, the first dummy cell, and insert, on the circuit design and after removing the first dummy cell, the plurality of dummy cells to obtain a modified circuit design; and a graphical user interface executing on the computer processor for causing the computer processor to; receive the plurality of dummy cell modification parameters, and present the modified circuit design to manufacture a semiconductor wafer, wherein device degradation is reduced during manufacturing of the semiconductor wafer. - View Dependent Claims (12, 13, 14, 15)
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16. A non-transitory computer readable medium storing instructions for manipulating a circuit design, the instructions comprising functionality to:
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receive a plurality of dummy cell modification parameters; select, based on the plurality of dummy cell modification parameters, a dummy cell insertion region on the circuit design; generate, in the dummy cell insertion region, a plurality of dummy cells; select a first dummy cell from the plurality of dummy cells; determine, based on a location of the first dummy cell, an illegal overlap with the first dummy cell; remove, in response to determining the illegal overlap and from the plurality of dummy cells, the first dummy cell; insert, on the circuit design and after removing the first dummy cell, the plurality of dummy cells to obtain a modified circuit design; and present the modified circuit design to manufacture a semiconductor wafer, wherein device degradation is reduced during manufacturing of the semiconductor wafer. - View Dependent Claims (17, 18, 19, 20)
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Specification