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Lithographic apparatus and device manufacturing method

  • US 9,341,960 B2
  • Filed: 11/14/2012
  • Issued: 05/17/2016
  • Est. Priority Date: 12/05/2011
  • Status: Active Grant
First Claim
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1. An exposure apparatus, comprising:

  • a projection system, configured to project a plurality of radiation beams onto a target; and

    an image slicer used in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region, wherein the apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.

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