Lithographic apparatus and device manufacturing method
First Claim
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1. An exposure apparatus, comprising:
- a projection system, configured to project a plurality of radiation beams onto a target; and
an image slicer used in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region, wherein the apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.
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Abstract
An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.
70 Citations
20 Claims
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1. An exposure apparatus, comprising:
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a projection system, configured to project a plurality of radiation beams onto a target; and an image slicer used in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region, wherein the apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A device manufacturing method comprising:
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using a projection system to project a plurality of radiation beams onto a target; using an image slicer in an inverted configuration in order to adjust radiation beam paths of the radiation beams, the image slicer in the inverted configuration configured such that, if an input image formed of a plurality of separated image regions is provided to the image slicer, it outputs an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region; and inputting each of the radiation beams into the image slicer at a location corresponding to a respective one of the separated image regions. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification