Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-reactants
First Claim
1. A method of forming a SiC/SiCN film layer on a surface of a semiconductor substrate in a processing chamber, the method comprising:
- introducing a silicon-containing film-precursor into the processing chamber;
introducing an organometallic ligand transfer reagent into the processing chamber, wherein the organometallic ligand transfer regent comprises zinc;
adsorbing the silicon-containing film-precursor, the organometallic ligand transfer reagent, or both onto the surface under conditions whereby either or both form an adsorption-limited layer;
reacting the silicon-containing film-precursor with the organometallic ligand transfer reagent at a temperature of between about 20 and 100°
C., after either or both have formed the adsorption-limited layer, to form the film layer and a byproduct which contains substantially all of the metal zinc of the organometallic ligand transfer reagent; and
removing the byproduct from the processing chamber.
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Abstract
Disclosed herein are methods of forming SiC/SiCN film layers on surfaces of semiconductor substrates. The methods may include introducing a silicon-containing film-precursor and an organometallic ligand transfer reagent into a processing chamber, adsorbing the silicon-containing film-precursor, the organometallic ligand transfer reagent, or both onto a surface of a semiconductor substrate under conditions whereby either or both form an adsorption-limited layer, and reacting the silicon-containing film-precursor with the organometallic ligand transfer reagent, after either or both have formed the adsorption-limited layer. The reaction results in the forming of the film layer. In some embodiments, a byproduct is also formed which contains substantially all of the metal of the organometallic ligand transfer reagent, and the methods may further include removing the byproduct from the processing chamber. Also disclosed herein are semiconductor processing apparatuses for forming SiC/SiCN film layers.
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Citations
20 Claims
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1. A method of forming a SiC/SiCN film layer on a surface of a semiconductor substrate in a processing chamber, the method comprising:
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introducing a silicon-containing film-precursor into the processing chamber; introducing an organometallic ligand transfer reagent into the processing chamber, wherein the organometallic ligand transfer regent comprises zinc; adsorbing the silicon-containing film-precursor, the organometallic ligand transfer reagent, or both onto the surface under conditions whereby either or both form an adsorption-limited layer; reacting the silicon-containing film-precursor with the organometallic ligand transfer reagent at a temperature of between about 20 and 100°
C., after either or both have formed the adsorption-limited layer, to form the film layer and a byproduct which contains substantially all of the metal zinc of the organometallic ligand transfer reagent; andremoving the byproduct from the processing chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A semiconductor processing apparatus for forming a SiC/SiCN film layer on a surface of a semiconductor substrate, the apparatus comprising:
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a processing chamber having a substrate holder within the chamber; a reactant delivery system fluidically connected to the processing chamber; one or more vacuum pumps; one or more gas outlets fluidically connecting the processing chamber to the one or more vacuum pumps; and a system controller comprising a non-transitory machine readable medium comprising machine readable code, the code comprising; instructions for operating the reactant delivery system to introduce a silicon-containing film-precursor into the processing chamber so that the silicon-containing film-precursor adsorbs onto a surface of the substrate; instructions for operating the reactant delivery system to introduce an organometallic ligand transfer reagent into the processing chamber, wherein the organometallic ligand transfer regent comprises zinc; instructions for maintaining a temperature within the processing chamber between about 20 and 100°
C. while the organometallic ligand transfer reagent reacts with the adsorbed silicon-containing film-precursor to form a film layer and a byproduct which contains substantially all of the zinc; andinstructions for operating the one or more gas outlets to evacuate the byproduct from the processing chamber. - View Dependent Claims (15, 16, 17, 18)
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19. A method of forming a SiC/SiCN film layer on a surface of a semiconductor substrate in a processing chamber, the method comprising:
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introducing a silicon-containing film-precursor into the processing chamber; introducing an organometallic ligand transfer reagent into the processing chamber, wherein the organometallic ligand transfer regent comprises zinc and carbon; adsorbing the silicon-containing film-precursor, the organometallic ligand transfer reagent, or both onto the surface under conditions whereby either or both form an adsorption-limited layer; reacting the silicon-containing film-precursor with the organometallic ligand transfer reagent, after either or both have formed the adsorption-limited layer, to form the film layer and a byproduct, the film layer containing carbon transferred from the organometallic ligand transfer reagent, and the byproduct containing substantially all of the zinc of the organometallic ligand transfer reagent; and removing the byproduct from the processing chamber. - View Dependent Claims (20)
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Specification