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Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-reactants

  • US 9,343,296 B2
  • Filed: 02/25/2015
  • Issued: 05/17/2016
  • Est. Priority Date: 01/10/2013
  • Status: Active Grant
First Claim
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1. A method of forming a SiC/SiCN film layer on a surface of a semiconductor substrate in a processing chamber, the method comprising:

  • introducing a silicon-containing film-precursor into the processing chamber;

    introducing an organometallic ligand transfer reagent into the processing chamber, wherein the organometallic ligand transfer regent comprises zinc;

    adsorbing the silicon-containing film-precursor, the organometallic ligand transfer reagent, or both onto the surface under conditions whereby either or both form an adsorption-limited layer;

    reacting the silicon-containing film-precursor with the organometallic ligand transfer reagent at a temperature of between about 20 and 100°

    C., after either or both have formed the adsorption-limited layer, to form the film layer and a byproduct which contains substantially all of the metal zinc of the organometallic ligand transfer reagent; and

    removing the byproduct from the processing chamber.

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