Apparatus and method for providing a laser shot file

• US 9,345,620 B2
• Filed: 04/29/2011
• Issued: 05/24/2016
• Est. Priority Date: 10/30/2008
• Status: Active Grant

• Current Assignee: Ernst Hegels, Gerhard Youssefi
• Original Assignee: Ernst Hegels, Gerhard Youssefi
• Inventors: Youssefi, Gerhard, Hegels, Ernst
• Primary Examiner(s): FARAH, AHMED M
• Application Number:
  US13/098,267
• Publication Number:
  US 20110276043A1
• Time in Patent Office: 1,852 Days
• Field of Search: 606 4- 6, 606 10- 12, 351205-212, 623/4.1, 623 511- 516, 623 611- 615, 128/898
• US Class Current: 1/1
• CPC Class Codes: A61F 2009/00848 based on wavefront
• CPC Class Codes: A61F 2009/00857 considering biodynamics
• CPC Class Codes: A61F 2009/00872 Cornea
• CPC Class Codes: A61F 2009/0088 based on wavefront
• CPC Class Codes: A61F 2009/00882 based on topography
• CPC Class Codes: A61F 9/008 using laser
• CPC Class Codes: A61F 9/00806 Correction of higher orders

Abstract

The invention relates to an apparatus, an algorithm and a method for providing a laser shot file for use in a laser. The laser may be an excimer laser. The shot file may be applied for performing a refractive laser treatment of an eye or for producing a customized contact lens or an intraocular lens. According to the invention information with respect to a desired ablation profile is provided and a first series of laser shot positions is calculated based on the desired ablation profile. A simulated ablation profile is generated using said first series of laser shot positions and using information about pulse characteristics of a single laser shot. The simulated ablation profile is compared with the desired ablation profile and residual structures are determined.

Claims

1. A method for providing a laser shot file for use in a laser, the method comprising:

a) providing information obtained from an eye to be treated,

b) calculating a desired ablation profile based on information obtained from the eye to be treated,

c) calculating a first series of laser shot positions based on the desired ablation profile,

d) generating a first simulated ablation profile using said first series of laser shot positions and using information about pulse characteristics of a single laser shot,

e) comparing the first simulated ablation profile with the desired ablation profile and determining residual structures, and

f) calculating a second series of laser shot positions based on the desired ablation profile and the determined residual structures.

2. The method of claim 1 further comprising:

g) generating a second simulated ablation profile using the second series of laser shot positions and using information about pulse characteristics of a single laser shot,

h) comparing the second simulated ablation profile with the desired ablation profile and determining further residual structures, and

i) calculating a further series of laser shot positions based on the desired ablation profile and the determined further residual structures.

3. The method of claim 2, comprising repeating steps f) to g) at least one time, wherein the further series of laser shot positions is used as the second series of laser shot positions.

4. The method of claim 1, wherein the desired ablation profile is calculated based on wavefront information obtained for the eye to be treated, and wherein the wavefront information is preferably given in Zernike coefficients.

5. The method of claim 4, wherein the wavefront information is given as a wavefront of nth-order, and wherein said first series of laser shot positions is calculated based on said nth-order wavefront.

6. The method of claim 5, wherein the difference between the first simulated ablation profile and the desired ablation profile is determined by calculating the difference of a simulated wavefront and a desired wavefront to obtain a residual wavefront, wherein the residual wavefront is described with Zernike coefficients.

7. The method of claim 6, wherein for the following iteration the residual wavefront is added to the previously calculated wavefront.

8. The method of claim 6, wherein the difference between the simulated wavefront and the desired wavefront is filtered to obtain low and/or high spatial frequencies by calculating Zernike coefficients up to the order N′

, and wherein in each iteration step a respective N'"'"'th order of the Zernike coefficients is used, and wherein

N′

=n−

2*iteration_counter,

with n being the order of the wavefront information and iteration_counter=number of iteration.

9. The method of claim 8, wherein in each iteration step the corrected wavefront is used for calculating a respective series of laser shot positions, and wherein the iteration steps N′

is less than 3.

10. The method of claim 1, further comprising:

controlling a laser apparatus responsive to the provided laser shot file.

11. The method of claim 1, wherein the laser shot file is for use in an excimer laser.

12. The method of claim 1 wherein the laser and the laser shot file are configured for producing a customized contact lens or an intraocular lens.

13. The method of claim 1 wherein the laser and the laser shot file are configured for performing a refractive laser treatment of the eye.