Capacitance-based pressure sensor including pressure vessel(s)

• US 9,347,846 B2
• Filed: 03/25/2014
• Issued: 05/24/2016
• Est. Priority Date: 03/25/2014
• Status: Active Grant

• Current Assignee: ROHM Co., Ltd.
• Original Assignee: Kionix Incorporated (ROHM Co., Ltd.)
• Inventors: Adams, Scott G.
• Primary Examiner(s): Allen, Andre
• Application Number:
  US14/224,535
• Publication Number:
  US 20150276532A1
• Time in Patent Office: 791 Days
• Field of Search: None
• US Class Current: 1/1
• CPC Class Codes: G01L 13/021 using deformable tubes
• CPC Class Codes: G01L 13/028 using capsules
• CPC Class Codes: G01L 9/0073 using a semiconductive diaphragm
• CPC Class Codes: G01L 9/0086 using variations in capacitance
• CPC Class Codes: G01L 9/0095 using variations in capacitance
• CPC Class Codes: H01G 13/00 Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
• CPC Class Codes: H01G 5/40 Structural combinations of variable capacitors with other electric elements not covered by this subclass, the structure mainly consisting of a capacitor, e.g. RC combinations
• CPC Class Codes: Y10T 29/43 Electric condenser making

Abstract

Techniques are described herein that perform capacitance-based pressure sensing using pressure vessel(s). A pressure vessel is an object that has a cross section that defines a void. The void has a shape that is configured to change based on a change of pressure difference between a cavity pressure in a cavity in which at least a portion of the pressure vessel is suspended and a vessel pressure in the pressure vessel. The pressure vessel may be formed in the shape of an enclosed loop (e.g., along a path that is perpendicular to the cross section), resulting in a looped pressure vessel. For instance, an end of the pressure vessel may be connected to another end of the pressure vessel to form the enclosed loop.

Claims

1. A pressure sensor comprising:

a semiconductor substrate that includes a first cavity;

a pressure vessel having a cross section that defines a void, the void having a shape that is configured to change based on a change of pressure difference between a cavity pressure in the first cavity and a vessel pressure in the pressure vessel, at least a first portion of the pressure vessel suspended in the first cavity; and

a capacitive structure coupled to the first portion of the pressure vessel, the capacitive structure configured to provide a first capacitance that changes with the shape of the void.

2. The pressure sensor of claim 1, wherein the first portion of the pressure vessel comprises:

first and second oxide walls on opposing sides of an axis that is perpendicular to a top surface of the semiconductor substrate to define the void between the first and second oxide walls; and

wherein the capacitive structure comprises;

first and second metallization layers coupled to the respective first and second oxide walls.

3. The pressure sensor of claim 1, wherein a second portion of the pressure vessel is external to the first cavity;

and

wherein at least a part of the second portion is removed to provide a vessel pressure port that exposes a first environment in the pressure vessel to a second environment that is external to the pressure vessel.

4. The pressure sensor of claim 1, wherein a second portion of the pressure vessel is external to the first cavity;

wherein the semiconductor substrate includes a second cavity that is external to the first cavity;

wherein at least a part of the second portion of the pressure vessel is included in the second cavity; and

wherein the part of the second portion has an opening that exposes a first environment in the pressure vessel to a second environment in the second cavity.

5. The pressure sensor of claim 4, further comprising:

a lid that includes a hole to provide a vessel pressure port that exposes the first environment and the second environment to a third environment that is external to the pressure sensor.

6. The pressure sensor of claim 1, further comprising:

at least one additional pressure vessel, each additional pressure vessel having a respective cross section that defines a respective void, each void of the respective additional pressure vessel having a shape that is configured to change based on a change of pressure difference between the cavity pressure in the first cavity and a respective vessel pressure in the respective additional pressure vessel, at least a portion of each additional pressure vessel suspended in the first cavity;

wherein the capacitive structure is coupled to the portion of each additional pressure vessel, the capacitive structure configured to provide the first capacitance that changes also with the shape of each void of the respective additional pressure vessel.

7. The pressure sensor of claim 1, wherein the pressure vessel is in a shape of an enclosed loop;

and

wherein at least a support portion of the pressure vessel is embedded in the semiconductor substrate external to the first cavity.

8. The pressure sensor of claim 1, wherein the pressure vessel is in a shape of an enclosed loop;

wherein the pressure sensor further comprises;

at least one additional pressure vessel, each additional pressure vessel having a respective cross section that defines a respective void, each void of the respective additional pressure vessel having a shape that is configured to change based on a change of pressure difference between the cavity pressure in the first cavity and a respective vessel pressure in the respective additional pressure vessel, at least a portion of each additional pressure vessel suspended in the first cavity; and

wherein each additional pressure vessel is in a shape of a respective enclosed loop.

9. The pressure sensor of claim 1, wherein the pressure vessel is in a shape of an enclosed loop, the enclosed loop having an inner perimeter and an outer perimeter;

and

wherein the capacitive structure includes a first metallization layer coupled to at least a portion of the inner perimeter and a second metallization layer coupled to at least a portion of the outer perimeter.

10. The pressure sensor of claim 9, wherein the first metallization layer is electrically connected to a portion of the semiconductor substrate that is within the inner perimeter of the enclosed loop.

11. The pressure sensor of claim 10, further comprising:

a metallization trace that is configured to electrically connect the portion of the semiconductor substrate that is within the inner perimeter of the enclosed loop to an element outside the outer perimeter of the enclosed loop.

12. The pressure sensor of claim 11, wherein the second metallization layer is electrically connected to an interior portion of the semiconductor substrate that is along a perimeter of the first cavity but exterior to the inner perimeter of the enclosed loop.

13. The pressure sensor of claim 12, further comprising

a bounding isolation trench that separates the interior portion of the semiconductor substrate from a portion of the semiconductor substrate exterior to the bounding isolation trench.

14. The pressure sensor of claim 13, further comprising:

a second metallization trace that is configured to electrically connect the interior portion of the semiconductor substrate to a second element outside the bounding isolation trench.

15. The pressure sensor of claim 1, wherein the semiconductor substrate includes a second cavity that is external to the first cavity;

wherein the pressure sensor further comprises;

a second pressure vessel having a second cross section that defines a second void, the second void having a shape that is configured to change based on a change of pressure difference between a second cavity pressure in the second cavity and a second vessel pressure in the second pressure vessel, at least a portion of the second pressure vessel suspended in the second cavity; and

a second capacitive structure coupled to the portion of the second pressure vessel, the second capacitive structure configured to provide a second capacitance that changes with the shape of the second void;

wherein the first vessel pressure in the first pressure vessel and the second cavity pressure in the second cavity are same;

wherein the second vessel pressure in the second pressure vessel and the first cavity pressure in the first cavity are same; and

wherein the second vessel pressure is a reference pressure.

16. The pressure sensor of claim 15, further comprising:

a lid that covers the first cavity, the lid sealing the first cavity in a vacuum to provide the first cavity pressure.

17. The pressure sensor of claim 15, further comprising:

a lid that covers the first cavity, the lid sealing the first cavity to provide the first cavity pressure of approximately one atmosphere.

18. The pressure sensor of claim 15, further comprising:

a transport vessel that includes an interior pressure port and an exterior pressure port, the interior pressure port opening into the first cavity, the exterior pressure port opening to a region in which the first pressure is to be measured.

19. The pressure sensor of claim 18, wherein the first capacitive structure and the second capacitive structure are configured to provide a differential capacitance measurement that represents a pressure difference between the first vessel pressure and the second vessel pressure.

20. The pressure sensor of claim 1, further comprising:

a lid that covers the first cavity, the lid sealing the first cavity in a vacuum to provide the cavity pressure.

21. The pressure sensor of claim 1, further comprising:

a lid that covers the first cavity, the lid sealing the first cavity to provide the cavity pressure of approximately one atmosphere.

22. The pressure sensor of claim 1, comprising a plurality of capacitive structures configured in a grid having a first diagonal that includes a first subset of the plurality of capacitive structures and a second diagonal that includes a second subset of the plurality of capacitive structures, the plurality of capacitive structures including the first capacitive structure;

wherein first capacitances of capacitive structures in the first subset increase with an increase of a measurement pressure; and

wherein second capacitances of capacitive structures in the second subset decrease with the increase of the measurement pressure; and

wherein the plurality of capacitive structures is configured to provide a differential capacitance based on a difference between the first capacitances and the second capacitances.

23. A method comprising:

providing a semiconductor substrate that includes a cavity;

fabricating a pressure vessel having a cross section that defines a void, the void having a shape that is configured to change based on a change of pressure difference between a cavity pressure in the cavity and a vessel pressure in the pressure vessel, at least a portion of the pressure vessel suspended in the cavity; and

fabricating a capacitive structure coupled to the portion of the pressure vessel, the capacitive structure configured to provide a capacitance that changes with the shape of the void.

24. The method of claim 23, wherein fabricating the pressure vessel comprises:

providing first and second oxide walls on opposing sides of an axis that is perpendicular to a top surface of the semiconductor substrate to define the void between the first and second oxide walls; and

wherein fabricating the capacitive structure comprises;

forming first and second metallization layers on the respective first and second oxide walls.

25. The method of claim 23, wherein fabricating the pressure vessel comprises:

shaping the pressure vessel to form an enclosed loop; and

embedding at least a support portion of the pressure vessel in the semiconductor substrate external to the cavity.

26. A method comprising:

embedding at least a support portion of a pressure vessel that is in a shape of an enclosed loop in a semiconductor substrate external to a cavity in the semiconductor substrate in which the pressure vessel is suspended, the pressure vessel having a cross section that defines a void, the void having a shape that is configured to change based on a change of pressure difference between a cavity pressure in the cavity and a vessel pressure in the pressure vessel, the enclosed loop having an inner perimeter and an outer perimeter;

providing first and second metallization layers on respective inner and outer perimeters of the enclosed loop, the first metallization layer being electrically connected to a portion of the semiconductor substrate that is within the inner perimeter of the enclosed loop;

routing a first metallization trace from the portion of the semiconductor substrate that is within the inner perimeter of the enclosed loop to a first electrode on a top surface of the semiconductor substrate that is outside an isolation barrier that surrounds the cavity; and

routing a second metallization trace from the second metallization layer to a second electrode on the top surface of the semiconductor substrate that is outside the isolation barrier.

27. A method comprising:

receiving a cavity pressure in a cavity that is included in a semiconductor substrate of a pressure sensor;

receiving a vessel pressure in a pressure vessel of the pressure sensor, at least a portion of the pressure vessel being suspended in the cavity; and

measuring a capacitance that changes with a shape of a void that is defined by a cross section of the pressure vessel using a capacitive structure that is coupled to the portion of the pressure vessel.

28. The method of claim 27, wherein measuring the capacitance comprises:

measuring the capacitance between first and second metallization layers on respective first and second oxide walls that define the void and that are on opposing sides of an axis that is perpendicular to a top surface of the semiconductor substrate.