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Integrated mask-aware lithography modeling to support off-axis illumination and multi-tone masks

  • US 9,354,511 B2
  • Filed: 12/06/2013
  • Issued: 05/31/2016
  • Est. Priority Date: 12/06/2013
  • Status: Active Grant
First Claim
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1. A method of performing optical lithography simulation implemented in a computer upon receipt of a multi-tone mask having a plurality of mask tones, the method comprising:

  • generating, using a computing device, a function with polarization having a portion representing a tone mask matrix and a portion representing a characteristic transmission (CT) function matrix based on the multi-tone mask, wherein the CT function matrix is a function of light source point information and not a function of mask geometry information; and

    generating one or more convolution kernel for the multi-tone mask from the CT function for use in a Hopkins'"'"' form for calculating light intensity for the optical lithography simulation.

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