Semiconductor devices comprising floating gate transistors and methods of forming such semiconductor devices

• US 9,356,157 B2
• Filed: 03/24/2014
• Issued: 05/31/2016
• Est. Priority Date: 06/14/2007
• Status: Active Grant

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Sandhu, Gurtej S., Mouli, Chandra V., Li, Di
• Primary Examiner(s): VU, HUNG K
• Application Number:
  US14/223,410
• Publication Number:
  US 20140252449A1
• Time in Patent Office: 799 Days
• Field of Search: 257315-317, 257319-322, 257/324, 257/E21.209, 257/E29.128, 257/E29.3
• US Class Current: 1/1
• CPC Class Codes: H01L 29/40114 the electrodes comprising a conductor-insulator-conductor-insulator-semiconductor structure
• CPC Class Codes: H01L 29/42324 Gate electrodes for transistors with a floating gate
• CPC Class Codes: H01L 29/42376 characterised by the length or the sectional shape
• CPC Class Codes: H01L 29/66825 with a floating gate H01L29/6684 takes precedence
• CPC Class Codes: H01L 29/788 with floating gate H01L29/78391 takes precedence
• CPC Class Codes: H01L 29/7883 charging by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
• CPC Class Codes: H10K 50/844 Encapsulations
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass

Abstract

Semiconductor devices include one or more transistors having a floating gate and a control gate. In at least one embodiment, the floating gate comprises an intermediate portion extending between two end portions. The intermediate portion has an average cross-sectional area less than one or both of the end portions. In some embodiments, the intermediate portion may comprise a single nanowire. In additional embodiments, semiconductor devices have one or more transistors having a control gate and a floating gate in which a surface of the control gate opposes a lateral side surface of a floating gate that defines a recess in the floating gate. Electronic systems include such semiconductor devices. Methods of forming semiconductor devices include, for example, forming a floating gate having an intermediate portion extending between two end portions, and configuring the intermediate portion to have an average cross-sectional area less than one or both of the end portions.

Claims

1. A semiconductor device including at least one transistor comprising:

a floating gate including;

a first end portion;

a second end portion opposite the first end portion; and

an intermediate portion extending between the first end portion and the second end portion, the intermediate portion including a curved recess in at least one outside surface of the intermediate portion, the intermediate portion of the floating gate having a smaller average cross-section than an average cross-section of the first end portion of the floating gate and a smaller average cross-section than an average cross-section of the second end portion of the floating gate; and

a control gate capacitively coupled with and electrically isolated from the floating gate, the control gate comprising at least one protrusion disposed at least partially within the curved recess of the intermediate portion.

2. The semiconductor device of claim 1, wherein the control gate comprises a surface opposing the second end portion of the floating gate.

3. The semiconductor device of claim 2, wherein the control gate includes at least one surface that has a shape that is complimentary to the at least one outside surface of the intermediate portion of the floating gate.

4. The semiconductor device of claim 1, wherein the protrusion of the control gate is configured to substantially fill the curved recess in the at least one outside surface of the intermediate portion of the floating gate.

5. The semiconductor device of claim 1, wherein the control gate is configured to at least substantially surround an outside periphery of the intermediate portion of the floating gate.

6. The semiconductor device of claim 1, wherein the intermediate portion of the floating gate has an average width of less than about 50 nanometers.

7. The semiconductor device of claim 1, wherein the average cross-section of the first end portion of the floating gate is at least substantially equal to the average cross-section of the second end portion of the floating gate.

8. A method of forming a semiconductor device having at least one transistor, the method comprising:

disposing a floating gate proximate to a semiconductor material, the floating gate comprising a first end portion opposite a second end portion;

removing a portion of the floating gate to form a curved recess in at least one outside surface of an intermediate portion of the floating gate, the intermediate portion extending between the first end portion and the second end portion of the floating gate and having a smaller average cross-section than an average cross-section of the first end portion of the floating gate and a smaller average cross-section than an average cross-section of the second end portion of the floating gate; and

disposing a control gate proximate to the floating gate with at least a portion of the floating gate extending into the curved recess in the at least one outside surface of the intermediate portion of the floating gate with the control gate electrically isolated from and capacitively coupled to the floating gate.

9. The method of claim 8, wherein disposing the floating gate proximate to the semiconductor material comprises disposing the floating gate proximate to a tunnel dielectric that is configured to electrically insulate the semiconductor material from the floating gate.

10. The method of claim 8, wherein disposing the floating gate proximate to the semiconductor material comprises disposing a doped semiconductor material with an average dopant concentration in the intermediate portion that is different from an average dopant concentration of the first end portion and an average dopant concentration of the second end portion.

11. The method of claim 10, wherein removing the portion of the floating gate to form the curved recess in the at least one outside surface of the intermediate portion of the floating gate comprises subjecting the at least one outside surface to a process that removes the doped semiconductor material at a rate that is affected by the dopant concentration of the doped semiconductor material.

12. The method of claim 11, wherein subjecting the at least one outside surface to a process that removes the doped semiconductor material at a rate that is affected by the dopant concentration of the doped semiconductor material comprises one of an etching process and an oxidation process.

13. The method of claim 10, wherein disposing the doped semiconductor material with the average dopant concentration in the intermediate portion that is different from the average dopant concentration of the first end portion and the average dopant concentration of the second end portion comprises disposing the doped semiconductor material with a dopant concentration that varies at least substantially continuously between the first end portion and the second end portion of the floating gate.

14. The method of claim 10, wherein disposing the doped semiconductor material with the average dopant concentration in the intermediate portion that is different from the average dopant concentration of the first end portion and the average dopant concentration of the second end portion comprises disposing the doped semiconductor material with a dopant concentration that varies at least substantially in a step-wise manner between the first end portion and the intermediate portion, and between the intermediate portion and the second end portion.

15. A semiconductor device including at least one transistor comprising:

a semiconductor material;

a floating gate electrically isolated from the semiconductor material, the floating gate comprising;

a first end portion;

a second end portion opposite the first end portion; and

an intermediate portion extending between the first end portion and the second end portion, the intermediate portion including at least one concave outside surface and having a smaller average cross-section than an average cross-section of the first end portion of the floating gate and a smaller average cross-section than an average cross-section of the second end portion of the floating gate; and

a control gate electrically isolated from the floating gate, the control gate comprising at least one surface opposing the at least one outside surface of the intermediate portion of the floating gate.

16. The semiconductor device of claim 15, wherein the at least one surface of the control gate includes a convex protrusion.

17. The semiconductor device of claim 16, wherein the convex protrusion of the at least one surface of the control gate has a shape that is complimentary to the at least one concave outside surface of the intermediate portion.

18. The semiconductor device of claim 15, wherein the semiconductor device comprises a memory device.

19. The semiconductor device of claim 18, wherein the memory device comprises at least one of a NOR memory device, a NAND memory device, and an electrically erasable programmable read-only memory device.

20. The semiconductor device of claim 18, wherein the memory device includes at least another transistor operably coupled in series to the at least one transistor.