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Apparatus and method for dielectric deposition

  • US 9,359,674 B2
  • Filed: 07/01/2014
  • Issued: 06/07/2016
  • Est. Priority Date: 01/10/2011
  • Status: Active Grant
First Claim
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1. A method for chemical vapor deposition of coatings of materials on a substrate at a temperature less than 150°

  • C. within an evacuated chamber containing two or more elongated electrodes, the method comprising;

    moving the substrate (i) perpendicular to a long dimension of a first electrode of said two or more elongated electrodes, (ii) parallel to a short dimension of the first electrode, and (iii) between said first electrode and a support structure in the evacuated chamber, wherein;

    (i) a minimum gap between a bottom surface of the first electrode and the substrate is less than a width of the first electrode, the width of the first electrode measured along the short dimension, (ii) the first electrode has one or more grooves running the long dimension of the first electrode and divides the first electrode into two or more main sections where each of said one or more grooves is between 5 millimeters and 4 centimeters wide, and (iii) the first electrode is connected to one or more alternating current (AC) power sources;

    powering the first electrode with said one or more AC power sources;

    injecting a first reactant gas into a first groove of said one or more grooves in said first electrode into a first region within the first groove furthest away from the substrate, so that the first reactant gas flows toward the substrate; and

    injecting a second gas including a gas-phase precursor compound containing at least one of silicon, metal, and carbon into a second region within the first groove, downstream of the first reactant gas flow from said first region, so that the second gas mixes with the first reactant gas to form a mixed gas with a gas pressure, and after flowing between the first electrode and the substrate, the mixed gas flows away from the substrate past a side defining the long dimension of said first electrode and is exhausted from the chamber.

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