×

Illumination system, lithographic apparatus and method

  • US 9,360,762 B2
  • Filed: 01/30/2012
  • Issued: 06/07/2016
  • Est. Priority Date: 02/02/2011
  • Status: Expired due to Fees
First Claim
Patent Images

1. An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors,wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, andwherein the first optical power is different from the second optical power.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×