Lithographic apparatus and device manufacturing method

• US 9,360,765 B2
• Filed: 08/03/2015
• Issued: 06/07/2016
• Est. Priority Date: 11/12/2002
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hoogendam, Christiaan Alexander, Derksen, Antonius Theodorus Anna Maria, Donders, Sjoerd Nicolaas Lambertus, Lof, Joeri, Loopstra, Erik Roelof, Mulkens, Johannes Catharinus Hubertus, Jansen, Hans, Verspay, Jacobus Johannus Leonardus Hendricus, Straaijer, Alexander, Streefkerk, Bob
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US14/816,997
• Publication Number:
  US 20150338748A1
• Time in Patent Office: 309 Days
• Field of Search: 355/30
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Abstract

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Claims

1. A lithographic projection apparatus comprising:

a movable table;

a projection system configured to project a patterned beam onto a target portion of a substrate;

a container structure at least partly defining a space between the projection system and the table, the container structure comprising an aperture having a cross-sectional area smaller than a cross-sectional area of the substrate, wherein the patterned beam is capable of being projected through the aperture onto the substrate;

an opening configured to supply liquid to the space; and

a closure part of the container structure, the closure part movable relative to another part of the container structure to selectively close and open the aperture.

2. The apparatus of claim 1, wherein the closure part is positionable on a side of the container structure opposite the projection system such that liquid can be confined in the container structure and between the projection system and the closure part.

3. The apparatus of claim 1, wherein the closure part is releasable from the container structure.

4. The apparatus of claim 3, wherein the closure part is separable from the remainder of the apparatus.

5. The apparatus of claim 1, wherein the container structure comprises an outlet configured to remove liquid from the space, the outlet located in a lower surface of the container structure facing during exposure the table and/or substrate.

6. The apparatus of claim 1, wherein the container structure comprises a channel configured to have the closure part therein.

7. The apparatus of claim 1, wherein the closure part is within the container structure.

8. A device manufacturing method comprising:

providing a liquid to a container structure at least partly defining a space between a projection system of a lithographic apparatus and a substrate, the container structure comprising an aperture having a cross-sectional area smaller than a cross-sectional area of the substrate;

projecting a patterned beam of radiation, through the liquid and the aperture, onto a target portion of the substrate using the projection system; and

selectively opening and closing the aperture by moving a closure part of the container structure with respect to another part of the container structure.

9. The method of claim 8, wherein the closure part is positionable on a side of the container structure opposite the projection system such that liquid can be confined in the container structure and between the projection system and the closure part.

10. The method of claim 8, further comprising releasing the closure part from the container structure.

11. The method of claim 10, wherein the closure part is separable from the remainder of the lithographic apparatus.

12. The method of claim 8, further comprising removing liquid from the space using an outlet of the container structure, the outlet located in a lower surface of the container structure facing during exposure the substrate.

13. The method of claim 8, further comprising moving the closure part within a channel of the container structure.

14. The method of claim 8, wherein the closure part is within the container structure.

15. A lithographic projection apparatus comprising:

a movable table;

a projection system configured to project a patterned beam onto a target portion of a substrate;

a container structure at least partly defining a space between the projection system and the table, the container structure comprising an aperture having a cross-sectional area smaller than a cross-sectional area of the substrate, wherein the patterned beam is capable of being projected through the aperture onto the substrate;

an opening formed in the container structure and configured to supply liquid to the space; and

a closure movable within or on the container structure to selectively close and open the aperture.

16. The apparatus of claim 15, wherein the closure comprises a plate.

17. The apparatus of claim 15, wherein the container structure comprises an outlet configured to remove liquid from the space, the outlet located in a lower surface of the container structure facing during exposure the table and/or substrate.

18. The apparatus of claim 15, wherein the container structure comprises a channel configured to have the closure move therein.

19. The apparatus of claim 15, wherein the closure part is positionable on a side of the container structure opposite the projection system such that liquid can be confined in the container structure and between the projection system and the closure.

20. The apparatus of claim 15, wherein the opening is part of the container structure and located above the aperture.