Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- a movable table;
a projection system configured to project a patterned beam onto a target portion of a substrate;
a container structure at least partly defining a space between the projection system and the table, the container structure comprising an aperture having a cross-sectional area smaller than a cross-sectional area of the substrate, wherein the patterned beam is capable of being projected through the aperture onto the substrate;
an opening configured to supply liquid to the space; and
a closure part of the container structure, the closure part movable relative to another part of the container structure to selectively close and open the aperture.
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Abstract
A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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Citations
20 Claims
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1. A lithographic projection apparatus comprising:
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a movable table; a projection system configured to project a patterned beam onto a target portion of a substrate; a container structure at least partly defining a space between the projection system and the table, the container structure comprising an aperture having a cross-sectional area smaller than a cross-sectional area of the substrate, wherein the patterned beam is capable of being projected through the aperture onto the substrate; an opening configured to supply liquid to the space; and a closure part of the container structure, the closure part movable relative to another part of the container structure to selectively close and open the aperture. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A device manufacturing method comprising:
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providing a liquid to a container structure at least partly defining a space between a projection system of a lithographic apparatus and a substrate, the container structure comprising an aperture having a cross-sectional area smaller than a cross-sectional area of the substrate; projecting a patterned beam of radiation, through the liquid and the aperture, onto a target portion of the substrate using the projection system; and selectively opening and closing the aperture by moving a closure part of the container structure with respect to another part of the container structure. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A lithographic projection apparatus comprising:
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a movable table; a projection system configured to project a patterned beam onto a target portion of a substrate; a container structure at least partly defining a space between the projection system and the table, the container structure comprising an aperture having a cross-sectional area smaller than a cross-sectional area of the substrate, wherein the patterned beam is capable of being projected through the aperture onto the substrate; an opening formed in the container structure and configured to supply liquid to the space; and a closure movable within or on the container structure to selectively close and open the aperture. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification