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Methods of fabricating BEOL interlayer structures

  • US 9,362,162 B2
  • Filed: 08/14/2014
  • Issued: 06/07/2016
  • Est. Priority Date: 08/14/2014
  • Status: Expired due to Fees
First Claim
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1. A method comprising:

  • providing an interlayer structure comprising;

    providing an uncured insulating layer above a substrate structure;

    forming an energy removal film over the uncured insulating layer;

    forming at least one opening through the energy removal film and extending at least partially into the uncured insulating layer; and

    applying energy to cure the uncured insulating layer and form a cured insulating layer, and to decompose in part the energy removal film and form a reduced thickness energy removal film over the cured insulating layer so as to decrease an aspect ratio of the at least one opening, wherein the interlayer structure comprises the cured insulating layer.

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