Method of manufacturing a light emitting, power generating or other electronic apparatus

• US 9,362,348 B2
• Filed: 08/27/2014
• Issued: 06/07/2016
• Est. Priority Date: 05/31/2007
• Status: Active Grant

• Current Assignee: NthDegree Technologies Worldwide Inc.
• Original Assignee: NthDegree Technologies Worldwide Inc.
• Inventors: Lowenthal, Mark David, Ray, William Johnstone, Shotton, Neil O., Blanchard, Richard A., Oraw, Brad, Lewandowski, Mark Allan, Baldridge, Jeffrey, Perozziello, Eric Anthony
• Primary Examiner(s): VETERE, ROBERT A
• Application Number:
  US14/469,664
• Publication Number:
  US 20140363908A1
• Time in Patent Office: 650 Days
• Field of Search: None
• US Class Current: 1/1
• CPC Class Codes: H01L 21/6836 Wafer tapes, e.g. grinding or dicing support tapes adhesive tapes in general C09J7/20
• CPC Class Codes: H01L 2224/24137 the bodies being arranged next to each other, e.g. on a common substrate
• CPC Class Codes: H01L 2224/32225 the item being non-metallic, e.g. insulating substrate with or without metallisation
• CPC Class Codes: H01L 2224/73267 Layer and HDI connectors
• CPC Class Codes: H01L 2224/95101 in a liquid medium
• CPC Class Codes: H01L 24/24 of an individual high density interconnect connector
• CPC Class Codes: H01L 24/95 at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/00014 the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
• CPC Class Codes: H01L 2924/09701 Low temperature co-fired ceramic [LTCC]
• CPC Class Codes: H01L 2924/12041 LED
• CPC Class Codes: H01L 2924/12042 LASER
• CPC Class Codes: H01L 2924/13033 TRIAC - Triode for Alternating Current - A bidirectional switching device containing two thyristor structures with common gate contact
• CPC Class Codes: H01L 2924/13034 Silicon Controlled Rectifier [SCR]
• CPC Class Codes: H01L 2924/1305 Bipolar Junction Transistor [BJT]
• CPC Class Codes: H01L 2924/1306 Field-effect transistor [FET]
• CPC Class Codes: H01L 2924/13062 Junction field-effect transistor [JFET]
• CPC Class Codes: H01L 2924/13091 Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
• CPC Class Codes: H01L 2924/14 Integrated circuits
• CPC Class Codes: H01L 31/03044 comprising a nitride compounds, e.g. GaN
• CPC Class Codes: H01L 31/035281 : Shape of the body
• CPC Class Codes: H01L 31/0475 : PV cell arrays made by cells in a planar, e.g. repetitive, configuration on a single semiconductor substrate; PV cell microarrays PV modules composed of a plurality of thin film solar cells deposited on the same substrate H01L31/046
• CPC Class Codes: H01L 31/068 : the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
• CPC Class Codes: H01L 31/1876 : Particular processes or apparatus for batch treatment of the devices
• CPC Class Codes: H01L 33/005 : Processes
• CPC Class Codes: H01L 33/20 : with a particular shape, e.g. curved or truncated substrate
• CPC Class Codes: H01L 33/38 : with a particular shape
• CPC Class Codes: H01L 33/382 : the electrode extending partially in or entirely through the semiconductor body
• CPC Class Codes: H10K 50/80 : Constructional details
• CPC Class Codes: H10K 50/805 : Electrodes
• CPC Class Codes: H10K 59/17 : Passive-matrix OLED displays
• CPC Class Codes: H10K 59/805 : Electrodes
• CPC Class Codes: H10K 59/90 : Assemblies of multiple devices comprising at least one organic light-emitting element
• CPC Class Codes: H10K 71/00 : Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: Y02E 10/544 : Solar cells from Group III-V materials
• CPC Class Codes: Y02E 10/547 : Monocrystalline silicon PV cells
• CPC Class Codes: Y02P 70/50 : Manufacturing or production processes characterised by the final manufactured product

Abstract

An exemplary printable composition of a liquid or gel suspension of diodes comprises a plurality of diodes, a first solvent and/or a viscosity modifier. An exemplary method of fabricating an electronic device comprises: depositing one or more first conductors; and depositing a plurality of diodes suspended in a mixture of a first solvent and a viscosity modifier. Various exemplary diodes have a lateral dimension between about 10 to 50 microns and about 5 to 25 microns in height. Other embodiments may also include a plurality of substantially chemically inert particles having a range of sizes between about 10 to about 50 microns.

Claims

1. A method of fabricating an electronic device, the method comprising:

depositing at least one first conductor; and

depositing a plurality of diodes suspended in a liquid or gel, each diode of the plurality of diodes comprising;

a light emitting or absorbing region having a lateral dimension between 10 microns to 40 microns and a height between 2 to 7 microns;

a first terminal coupled to the light emitting or absorbing region on a first side, the first terminal having a height less than 6 microns; and

a second terminal coupled to the light emitting or absorbing region on a second side opposite the first side, the second terminal having a height less than 6 microns;

wherein each diode of the plurality of diodes is substantially hexagonal laterally, has a lateral dimension between 10 to 50 microns measured opposing face-to-face, and a height between 5 to 25 microns.

2. The method of claim 1, wherein the liquid or gel comprises at least one solvent selected from the group consisting essentially of:

water;

alcohols, cyclic alcohols, ethers, esters, glycols, glycerols, carbonates, acetonitrile, tetrahydrofuran (THF), dimethyl formamide (DMF), N-methyl formamide (NMF), dimethyl sulfoxide (DMSO), and mixtures thereof.

3. The method of claim 2, wherein the liquid or gel further comprises at least one viscosity modifier selected from the group consisting essentially of:

clays, saccharides, polysaccharides, celluloses, modified celluloses, acrylate polymers and copolymers, (meth)acrylate polymers and copolymers, polyvinyl polymers and copolymers, polyethylene polymers and copolymers, ethers, esters, acetates, glycols, glycerols, fumed silica, silica powders, modified ureas, and mixtures thereof.

4. The method of claim 1, wherein each diode of the plurality of diodes has a lateral dimension measured opposing face-to:

face less than 30 microns and a height less than 15 microns.

5. The method of claim 1, wherein the step of depositing a plurality of diodes suspended in a liquid or gel further comprises depositing the plurality of diodes and a plurality of substantially optically transparent and chemically inert particles suspended in the liquid or gel, each inert particle of the plurality of substantially optically transparent and chemically inert particles between 10 to 50 microns.

6. The method of claim 1, wherein the plurality of diodes comprise at least one inorganic semiconductor selected from the group consisting essentially of:

silicon, gallium arsenide (GaAs), gallium nitride (GaN), GaP, InAlGaP, AlInGaAs, InGaNAs, and AlInGaSb, and mixtures or combinations thereof.

7. The method of claim 1, wherein the plurality of diodes comprise at least one organic semiconductor selected from the group consisting essentially of:

π

-conjugated polymers, poly(acetylene)s, poly(pyrrole)s, poly(thiophene)s, polyanilines, polythiophenes, poly(p-phenylene sulfide), poly(para-phenylene vinylene)s (PPV) and PPV derivatives, poly(3-alkylthiophenes), polyindole, polypyrene, polycarbazole, polyazulene, polyazepine, poly(fluorene)s, polynaphthalene, polyaniline, polyaniline derivatives, polythiophene, polythiophene derivatives, polypyrrole, polypyrrole derivatives, polythianaphthene, polythianaphthane derivatives, polyparaphenylene, polyparaphenylene derivatives, polyacetylene, polyacetylene derivatives, polydiacethylene, polydiacetylene derivatives, polyparaphenylenevinylene, polyparaphenylenevinylene derivatives, polynaphthalene, polynaphthalene derivatives, polyisothianaphthene (PITN), polyheteroarylenvinylene (ParV) in which the heteroarylene group is thiophene, furan or pyrrol, polyphenylene-sulphide (PPS), polyperinaphthalene (PPN), polyphthalocyanine (PPhc), and their derivatives, copolymers thereof, and mixtures or combinations thereof.

8. The method of claim 1, wherein the step of depositing a plurality of diodes suspended in a liquid or gel further comprises depositing the plurality of diodes suspended in the liquid or gel over the at least one first conductor and coupling the at least one first conductor to the first terminals of substantially all of the diodes of the plurality of diodes.

9. The method of claim 1, further comprising:

depositing at least one dielectric layer; and

depositing at least one second conductor over the dielectric layer and coupling the at least one second conductor to the second terminals of substantially all of the diodes of the plurality of diodes.

10. The method of claim 9, wherein the step of depositing the at least one first conductor further comprises:

depositing a first electrode comprising a first busbar and a first plurality of elongated conductors extending from the first busbar and a second electrode comprising a second busbar and a second plurality of elongated conductors extending from the second busbar, the second plurality of elongated conductors interdigitated with the first plurality of elongated conductors; and

wherein the step of depositing the at least one second conductor further comprises;

coupling the at least one second conductor to the second plurality of elongated conductors.

11. The method of claim 9, wherein the at least one first conductor is substantially optically transmissive, wherein the at least one first conductor is deposited over a substantially optically transmissive base on a first side, and wherein the method further comprises:

depositing a phosphor layer on a second side of the base.

12. The method of claim 9, wherein the at least one second conductor is substantially optically transmissive, and wherein the method further comprises:

depositing a phosphor layer over the at least one second conductor.

13. The method of claim 9, wherein the at least one first conductor or the at least one second conductor is substantially optically transmissive and comprises one or more compounds selected from the group consisting essentially of:

indium tin oxide (ITO), antimony tin oxide (ATO), polyethylene-dioxithiophene, and combinations or mixtures thereof.

14. The method of claim 9, further comprising:

depositing a barrier layer coupled to the dielectric layer and to the at least one second conductor, wherein the barrier layer comprises a viscosity modifier selected from the group consisting of;

clays, saccharides, polysaccharides, celluloses, modified celluloses, acrylate polymers and copolymers, (meth)acrylate polymers and copolymers, polyvinyl polymers and copolymers, polyethylene polymers and copolymers, ethers, esters, acetates, glycols, glycerols, fumed silica, silica powders, modified ureas, and mixtures thereof.

15. The method of claim 1, wherein the deposition steps further comprise at least one deposition process selected from the group consisting of:

printing, coating, rolling, spraying, layering, sputtering, lamination, screen printing, inkjet printing, electro-optical printing, electroink printing, photoresist printing, thermal printing, laser jet printing, magnetic printing, pad printing, flexographic printing, hybrid offset lithography, Gravure printing, and combinations thereof.

16. The method of claim 1, wherein the plurality of diodes are light emitting diodes or photovoltaic diodes.

17. A method of fabricating an electronic device, the method comprising:

depositing at least one first conductor;

depositing a plurality of diodes suspended in a liquid or gel, each diode of the plurality of diodes comprising;

a light emitting or absorbing region having a lateral dimension between 10 microns to 40 microns and a height between 2 to 7 microns;

a first terminal coupled to the light emitting or absorbing region on a first side, the first terminal having a height less than 6 microns; and

a second terminal coupled to the light emitting or absorbing region on a second side opposite the first side, the second terminal having a height less than 6 microns;

wherein each diode of the plurality of diodes has a lateral dimension between 10 to 50 microns and a height between 5 to 25 microns; and

wherein each diode of the plurality of diodes comprises at least one inorganic semiconductor selected from the group consisting essentially of;

silicon, gallium arsenide (GaAs), gallium nitride (GaN), GaP, InAlGaP, AlInGaAs, InGaNAs, and AlInGaSb, and mixtures or combinations thereof;

depositing at least one dielectric layer; and

depositing at least one second conductor over the dielectric layer.

18. The method of claim 17, wherein the step of depositing the at least one first conductor further comprises:

depositing a first electrode comprising a first busbar and a first plurality of elongated conductors extending from the first busbar and a second electrode comprising a second busbar and a second plurality of elongated conductors extending from the second busbar, the second plurality of elongated conductors interdigitated with the first plurality of elongated conductors; and

wherein the step of depositing the at least one second conductor further comprises;

coupling the at least one second conductor to the second plurality of elongated conductors.

19. The method of claim 17, wherein the at least one first conductor is substantially optically transmissive, wherein the at least one first conductor is deposited over a substantially optically transmissive base on a first side, and wherein the method further comprises:

depositing a first phosphor layer on a second side of the base.

20. The method of claim 19, wherein the at least one second conductor is substantially optically transmissive, and wherein the method further comprises:

depositing a second phosphor layer over the at least one second conductor.

21. The method of claim 17, wherein the at least one first conductor or the at least one second conductor is substantially optically transmissive and comprises one or more compounds selected from the group consisting essentially of:

indium tin oxide (ITO), antimony tin oxide (ATO), polyethylene-dioxithiophene, and combinations or mixtures thereof.

22. A method of fabricating an electronic device, the method comprising:

depositing at least one substantially optically transmissive first conductor over a substantially optically transmissive base, the at least one substantially optically transmissive first conductor comprising one or more compounds selected from the group consisting essentially of;

indium tin oxide (ITO), antimony tin oxide (ATO), polyethylene-dioxithiophene, and combinations or mixtures thereof;

depositing a plurality of diodes suspended in a liquid or gel, the liquid or gel comprising a mixture of at least one solvent and at least one viscosity modifier, each diode of the plurality of diodes comprising;

a light emitting or absorbing region having a lateral dimension between 10 microns to 40 microns and a height between 2 to 7 microns;

a first terminal coupled to the light emitting or absorbing region on a first side, the first terminal having a height less than 6 microns; and

a second terminal coupled to the light emitting or absorbing region on a second side opposite the first side, the second terminal having a height less than 6 microns;

wherein each diode of the plurality of diodes has a lateral dimension between 10 to 50 microns and a height between 5 to 25 microns; and

wherein each diode of the plurality of diodes comprises at least one inorganic semiconductor selected from the group consisting essentially of;

silicon, gallium arsenide (GaAs), gallium nitride (GaN), GaP, InAlGaP, AlInGaAs, InGaNAs, and AlInGaSb, and mixtures or combinations thereof;

depositing at least one dielectric layer; and

depositing at least one second conductor over the dielectric layer.