Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance

• US 9,365,450 B2
• Filed: 12/27/2012
• Issued: 06/14/2016
• Est. Priority Date: 12/27/2012
• Status: Active Grant

• Current Assignee: Guardian Glass LLC (KOCH Industries Incorporated)
• Original Assignee: Intermolecular Incorporated, Guardian Industries Corporation (KOCH Industries Incorporated)
• Inventors: Ding, Guowen, Boyce, Brent, Imran, Muhammad, Le, Minh Huu, Sun, Zhi-Wen, Wang, Yu, Xu, Yongli
• Primary Examiner(s): Austin, Aaron
• Assistant Examiner(s): Yang, Zheren J
• Application Number:
  US13/728,042
• Publication Number:
  US 20140186598A1
• Time in Patent Office: 1,265 Days
• US Class Current: 1/1
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/3618 Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
• CPC Class Codes: C03C 17/3644 the metal being silver
• CPC Class Codes: C03C 17/366 Low-emissivity or solar control coatings
• CPC Class Codes: C03C 17/3681 the multilayer coating being used in glazing, e.g. windows or windscreens
• CPC Class Codes: C03C 2217/734 comprising an alternation of high and low refractive indexes
• CPC Class Codes: Y10T 428/24975 No layer or component greater than 5 mils thick

Abstract

Low emissivity coated panels can be fabricated using a base layer having a low refractive index layer on a high refractive index layer. The low refractive index layer can have refractive index less than 1.5, and can include MgF₂, CaF₂, SiO₂, or BO. The high refractive index layer can have refractive index greater than 2.3, and can include TiO_x, NbO_x, or BiO_x. The multilayer base structure can allow color tuning with enhanced transmission, for example, as compared to similar structures having single layer base layer.

Claims

1. A low emissivity panel, comprising:

a transparent substrate;

a first layer formed directly on the substrate,

wherein the first layer comprises silicon-zirconium nitride;

a second layer formed directly on the first layer,

wherein the second layer has an index of refraction greater than 2.3,

wherein the second layer comprises bismuth oxide,

wherein the second layer has a thickness between 10 and 15 nm;

a third layer formed directly on the second layer,

wherein the third layer has an index of refraction less than 1.5,

wherein the third layer comprises boron oxide, magnesium fluoride, calcium fluoride, silicon oxide, or a combination thereof,

wherein the third layer has a thickness between 12 and 20 nm;

a fourth layer formed directly on the third layer,

wherein the fourth layer comprises zinc oxide, doped zinc oxide, tin oxide, or doped tin oxide; and

a fifth layer formed directly on the fourth layer,

wherein the fifth layer comprises silver, gold, or copper and is operable as an infrared reflective layer.

2. The low emissivity panel of claim 1 wherein the first layer has a thickness between 11 and 13 nm, and the second layer has a thickness between 16 and 18 nm.

3. The low emissivity panel of claim 1 wherein the fourth layer comprises zinc oxide.

4. The low emissivity panel of claim 1 further comprising

a barrier layer formed directly on the fifth layer, wherein the barrier layer comprises nickel, titanium, chromium, or a combination thereof.

5. A low emissivity panel, comprising:

a transparent substrate, wherein the transparent substrate comprises glass;

a first layer formed directly on the substrate,

wherein the first layer comprises silicon-zirconium nitride;

a second layer formed directly on the first layer,

wherein the second layer has an index of refraction greater than 2.3,

wherein the second layer comprises titanium oxide, niobium oxide, or bismuth oxide,

wherein the second layer has a thickness between 10 and 15 nm;

a third layer formed directly on the second layer,

wherein the third layer has an index of refraction less than 1.5,

wherein the third layer comprises calcium fluoride,

wherein third layer has a thickness between 12 and 20 nm;

a fourth layer formed directly on the third layer,

wherein the fourth layer comprises zinc oxide, doped zinc oxide, tin oxide, or doped tin oxide; and

a fifth layer formed directly on the fourth layer,

wherein the fifth layer comprises silver, gold, or copper and is operable as an infrared reflective layer.

6. The low emissivity panel of claim 5 wherein the fourth layer has a thickness of 10 nm.

7. The low emissivity panel of claim 5 wherein the second layer comprises bismuth oxide.

8. The low emissivity panel of claim 5 wherein the fourth layer comprises silver.