Method for preparing zero-mode waveguide arrays with coated walls

• US 9,366,814 B2
• Filed: 10/23/2013
• Issued: 06/14/2016
• Est. Priority Date: 09/11/2009
• Status: Active Grant

• Current Assignee: Pacific Bioscience of California Incorporated (L'Oreal SA)
• Original Assignee: Pacific Bioscience of California Incorporated (L'Oreal SA)
• Inventors: Gray, Jeremy, Cicero, Ronald L., Grot, Annette
• Primary Examiner(s): Beisner, William H
• Application Number:
  US14/061,348
• Publication Number:
  US 20140175052A1
• Time in Patent Office: 965 Days
• US Class Current: 1/1
• CPC Class Codes: C23F 1/00 Etching metallic material by chemical means manufacture of printing surfaces B41C; manufacture of printed circuits H05K
• CPC Class Codes: C23F 17/00 Multi-step processes for surface treatment of metallic material involving at least one process provided for in class C23 and at least one process covered by subclass C21D or C22F or class C25 coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups C23C2/00 - C23C26/00, or by combinations of methods providedfor in subclasses C23C and C25D, C23C28/00
• CPC Class Codes: C25D 11/022 Anodisation on selected surface areas
• CPC Class Codes: C25D 11/04 of aluminium or alloys based thereon
• CPC Class Codes: G01N 21/6452 Individual samples arranged in a regular 2D-array, e.g. multiwell plates
• CPC Class Codes: G01N 21/7743 the reagent-coated grating coupling light in or out of the waveguide
• CPC Class Codes: G02B 6/10 of the optical waveguide type G02B6/02, G02B6/24 take precedence; devices or arrangements for the control of light by electric, magnetic, electro-magnetic or acoustic means G02F1/00; transferring the modulation of modulated light G02F2/00; optical logic elements G02F3/00; optical analogue/digital converters G02F7/00
• CPC Class Codes: G02B 6/107 Subwavelength-diameter waveguides, e.g. nanowires
• CPC Class Codes: G02B 6/136 by etching

Abstract

The application relates to methods of manufacture of improved optical containment structures. The invention relates to arrays of zero-mode waveguide structures comprising nanoscale apertures having non-reflective coatings on their walls. The methods provide for selectively coating the walls of the zero mode waveguides, allowing for selective functionalization of the bases.

Claims

1. A method for producing waveguides having apertures that extend into a transparent substrate that are selectively functionalized on their bases comprising:

providing an array of zero mode waveguides comprising an opaque layer on top of a silica-based transparent substrate layer wherein the zero mode waveguides comprise nanoscale apertures extending through the opaque layer and extending into the transparent layer, each zero mode waveguide having walls and a base;

coating the array of zero mode waveguides such that the walls and the bases are coated with a non-reflective layer;

etching back the non-reflective layer to expose the transparent substrate at the bases of the zero mode waveguides, thereby producing a non-reflective layer selectively on the walls of the zero mode waveguides and on the walls of the apertures extending into the transparent substrate layer, and

treating the array with an agent that selectively functionalizes the aperture bases comprising exposed silica-based transparent substrate layer to produce an array of zero mode waveguides having apertures selectively functionalized on their bases.

2. The method of claim 1 wherein the coating process comprises a conformal coating.

3. The method of claim 1 wherein the etching back is performed using photolithography to define the region for etch back.

4. The method of claim 1 wherein bases of the apertures of the zero mode waveguides are selectively functionalized using a silane.

5. The method of claim 1 wherein the coating is performed using chemical vapor deposition (CVD).

6. The method of claim 1 wherein the coating is performed using atomic layer deposition (ALD).

7. The method of claim 1 wherein the coating is performed in the liquid phase.

8. The method of claim 1 wherein the non-reflective layer comprises an oxide.

9. The method of claim 8 wherein the oxide comprises Al₂0₃.

10. The method of claim 1 wherein the non-reflective layer comprises a polymer.

11. The method of claim 10 wherein the polymer comprises a polyimide.

12. The method of claim 1 wherein the array comprises more than 10,000 zero mode waveguides.

13. The method of claim 1 wherein the opaque layer comprises a metal.

14. The method of claim 1 wherein the zero mode waveguide has a diameter between about 1 nm and about 300 nm.

15. The method of claim 1 wherein the zero mode waveguide has a diameter between about 10 nm and about 200 nm.