Lithographic apparatus and device manufacturing method

• US 9,366,972 B2
• Filed: 04/30/2015
• Issued: 06/14/2016
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Kolesnychenko, Aleksey Yurievich, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Ritsema, Roelof Aeilko Siebrand, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Straaijer, Alexander, Van Santen, Helmar
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US14/701,236
• Publication Number:
  US 20150261102A1
• Time in Patent Office: 411 Days
• Field of Search: 355/30, 355/53
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Claims

1. A lithographic apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a projection system configured to project the patterned beam onto a target portion of a substrate;

a substrate table configured to hold the substrate;

an edge seal member configured to at least partly surround an edge of at least one of said substrate and an object positioned on said substrate table, and

a liquid supply system configured to provide a liquid in a space between a final element of said projection system and said at least one of said substrate and said object,

wherein said substrate table comprises a hydrophobic layer adjacent an edge portion of said edge seal member and adjacent said at least one of said substrate and said object, said hydrophobic layer arranged to face an opposite side of said edge seal member to said projection system and to face an opposite side of said at least one of said substrate and said object to said projection system.

2. The lithographic apparatus of claim 1, wherein said hydrophobic layer has a contact angle of greater than 90°

with said liquid.

3. The lithographic apparatus of claim 1, wherein the hydrophobic layer is in contact with the opposite side of the edge seal member.

4. The lithographic apparatus of claim 1, wherein the hydrophobic layer is out of contact with the opposite side of the at least one of said substrate and said object when the at least one of said substrate and said object is positioned on the substrate table.

5. The lithographic apparatus of claim 4, wherein a gap between the hydrophobic layer and the opposite side of the at least one of said substrate and said object is about 10 μ

m.

6. The lithographic apparatus of claim 1, wherein the hydrophobic layer is made of an inorganic material.

7. The lithographic apparatus of claim 1, wherein the hydrophobic layer is made of Teflon or silicon rubber.

8. The lithographic apparatus of claim 1, wherein the edge seal member is configured to provide a primary surface facing said projection system substantially co-planar with a primary surface of said at least one of said substrate and said object.

9. The lithographic apparatus of claim 1, wherein, in use, said liquid supply system provides liquid to a localized area of at least one of said object, said edge seal member and said substrate.

10. The lithographic apparatus of claim 1, wherein the edge seal member is an integral part of the substrate table.

11. The lithographic apparatus of claim 1, wherein the edge seal member is movable relative to the substrate table.

12. A support for contacting an undersurface of a substrate and holding the substrate, at least a portion of a top surface of the substrate to be immersed in liquid, the support comprising:

a substrate table configured to hold a substrate;

an edge seal member configured to at least partly surround an edge of at least one of said substrate and an object positioned on said substrate table, and

a hydrophobic layer adjacent an edge portion of said edge seal member and adjacent said at least one of said substrate and said object, the hydrophobic layer arranged to face the undersurface of the substrate.

13. The support of claim 12, wherein the edge seal member is an integral part of the substrate table.

14. The support of claim 12, wherein the edge seal member is movable relative to the substrate table.

15. The support of claim 12, wherein the edge seal member has a top surface for receiving the liquid and an undersurface that is opposite the top surface, wherein the hydrophobic layer is in contact with the undersurface of the edge seal member.

16. The support of claim 12, wherein the hydrophobic layer is out of contact with the undersurface of the substrate when the substrate is positioned on the substrate table.

17. The support of claim 12, wherein a gap between the hydrophobic layer and the undersurface of the substrate is about 10 μ

m.

18. The support of claim 12, wherein the hydrophobic layer is made of an inorganic material.

19. The support of claim 12, wherein the hydrophobic layer is made of Teflon or silicon rubber.

20. The support of claim 12, wherein the top surface of the edge seal member is substantially co-planar with the top surface of said at least one of said substrate and said object.