Thin film transistor array panel and method of manufacturing the same
First Claim
1. A thin film transistor array panel, comprising:
- a channel layer comprising an oxide semiconductor and formed in a semiconductor layer;
a source electrode formed in the semiconductor layer and connected to the channel layer at a first side of the channel layer;
a drain electrode formed in the semiconductor layer and connected to the channel layer at a second side of the channel layer, opposing the first side;
a pixel electrode formed in the semiconductor layer in a same portion of the semiconductor layer as the drain electrode;
an insulating layer disposed on the channel layer;
a gate line comprising a gate electrode disposed on the insulating layer;
a passivation layer disposed on the source electrode, the drain electrode, the pixel electrode, and the gate line; and
a data line disposed on the passivation layer,wherein a width of the channel layer is substantially equal to a width of the pixel electrode in a direction parallel to the gate line,wherein the source electrode, the channel layer, the drain electrode and the pixel electrode are disposed in a same plane extending in a straight line below the gate electrode,wherein the insulating layer covers the channel layer and does not extend beyond end portions of the channel layer,wherein the insulating layer is not overlapped with the source electrode, the drain electrode, and the pixel electrode, and wherein the source electrode and the drain electrode are not overlapped with the channel layer and the gate electrode.
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Accused Products
Abstract
A thin film transistor array panel may include a channel layer including an oxide semiconductor and formed in a semiconductor layer, a source electrode formed in the semiconductor layer and connected to the channel layer at a first side, a drain electrode formed in the semiconductor layer and connected to the channel layer at an opposing second side, a pixel electrode formed in the semiconductor layer in a same portion of the semiconductor layer as the drain electrode, an insulating layer disposed on the channel layer, a gate line including a gate electrode disposed on the insulating layer, a passivation layer disposed on the source and drain electrodes, the pixel electrode, and the gate line, and a data line disposed on the passivation layer. A width of the channel layer may be substantially equal to a width of the pixel electrode in a direction parallel to the gate line.
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Citations
30 Claims
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1. A thin film transistor array panel, comprising:
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a channel layer comprising an oxide semiconductor and formed in a semiconductor layer; a source electrode formed in the semiconductor layer and connected to the channel layer at a first side of the channel layer; a drain electrode formed in the semiconductor layer and connected to the channel layer at a second side of the channel layer, opposing the first side; a pixel electrode formed in the semiconductor layer in a same portion of the semiconductor layer as the drain electrode; an insulating layer disposed on the channel layer; a gate line comprising a gate electrode disposed on the insulating layer; a passivation layer disposed on the source electrode, the drain electrode, the pixel electrode, and the gate line; and a data line disposed on the passivation layer, wherein a width of the channel layer is substantially equal to a width of the pixel electrode in a direction parallel to the gate line, wherein the source electrode, the channel layer, the drain electrode and the pixel electrode are disposed in a same plane extending in a straight line below the gate electrode, wherein the insulating layer covers the channel layer and does not extend beyond end portions of the channel layer, wherein the insulating layer is not overlapped with the source electrode, the drain electrode, and the pixel electrode, and wherein the source electrode and the drain electrode are not overlapped with the channel layer and the gate electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method of manufacturing a thin film transistor array panel, comprising:
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forming an oxide semiconductor layer on an insulation substrate; forming an insulating layer and a gate line comprising a gate electrode on the oxide semiconductor layer; forming a channel layer, a source electrode, a drain electrode, and a pixel electrode in the oxide semiconductor layer by performing a reduction process on an exposed portion of the oxide semiconductor layer, wherein the channel layer is covered by the gate electrode, the source electrode is formed at a first side of the channel layer, the drain electrode is formed at a second side of the channel layer, opposing the first side, and wherein the pixel electrode and the drain electrode are formed in a same portion of the oxide semiconductor layer, and the exposed portion of the oxide semiconductor layer is not covered by the insulating layer and the gate line; forming a passivation layer on the source electrode, the drain electrode, the pixel electrode, and the gate line; and forming a data line on the passivation layer, wherein a width of the channel layer is formed to be substantially equal to a width of the pixel electrode in a direction parallel to the gate line, wherein the source electrode, the channel layer, the drain electrode and the pixel electrode are disposed in a same plane extending in a straight line below the gate electrode, wherein the insulating layer covers the channel layer and does not extend beyond end portions of the channel layer, wherein the insulating layer is not overlapped with the source electrode, the drain electrode, and the pixel electrode, and the source electrode and the drain electrode are not overlapped with the channel layer and the gate electrode. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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Specification