Lithographic apparatus and device manufacturing method

• US 9,372,412 B2
• Filed: 08/28/2015
• Issued: 06/21/2016
• Est. Priority Date: 02/09/2010
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Zwet, Erwin John, De Jager, Pieter Willem Herman, Onvlee, Johannes, Fritz, Erik Christiaan
• Primary Examiner(s): KREUTZER, COLIN WRIGHT
• Application Number:
  US14/839,663
• Publication Number:
  US 20150370177A1
• Time in Patent Office: 298 Days
• Field of Search: 355/46, 355/67, 355/77
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70366 Rotary scanning
• CPC Class Codes: G03F 7/70391 Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
• CPC Class Codes: G03F 7/704 Scanned exposure beam, e.g. raster-, rotary- and vector scanning mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358
• CPC Class Codes: G03F 7/70491 Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
• CPC Class Codes: G03F 7/70883 of optical system

Abstract

A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

Claims

1. A lithographic apparatus comprising:

a self-emissive contrast device configured to emit a beam;

a projection system configured to project the beam along an optical path onto a target portion of a substrate, the projection system comprising an optical element;

an actuator to move at least the optical element with respect to the substrate;

a first surface facing and immediately adjacent a radiation receiving surface of the optical element and with respect to which the radiation receiving surface of the optical element is movable, the first surface not having optical power and at least partly overlying the radiation receiving surface;

a second surface facing and immediately adjacent a radiation emitting surface of the optical element and with respect to which the radiation emitting surface of the optical element is movable; and

a control system configured to cause the self-emissive contrast device to modulate emission of the beam during projection and to cause the actuator to move the optical element during projection in a direction transverse to the optical path of the beam with respect to the first and second surfaces.

2. The apparatus according to claim 1, wherein the first and/or second surface is within about 2 cm from respectively the radiation receiving or emitting surface of the optical element.

3. The apparatus according to claim 1, wherein the first and/or second surface comprises a solid window or an open aperture having a width in the direction smaller than a width of the optical element in the direction.

4. The apparatus according to claim 1, wherein the optical column comprises a stationary part, and the self-emissive contrast device is provided to the stationary part.

5. The apparatus according to claim 1, wherein the actuator is a rotary motor and the movement of the moving part is a rotational movement.

6. The apparatus according to claim 5, wherein the rotational movement is more than 500 RPM.

7. The apparatus according to claim 5, wherein the projection system comprises a first optical group and a second optical group, the first optical group forms a first wheel shape portion of the projection system and the second optical group forms a second wheel shape portion of the projection system.

8. The apparatus according to claim 1, wherein the self-emissive contrast device comprises a laser diode.

9. The apparatus according to claim 1, comprising a compartment around the optical element, the first and/or second surface being part of the compartment.

10. The apparatus according to claim 9, wherein the compartment is substantially gas tight.

11. A device manufacturing method comprising:

emitting a beam with a self-emissive contrast device;

projecting the beam along an optical path onto a target portion of a substrate using a projection system, the projection system comprising an optical element;

causing the self-emissive contrast device to modulate emission of the beam during projection; and

during projection, moving the optical element (i) with respect to the substrate in a direction transverse to the optical path, (ii) with respect to a first surface facing and immediately adjacent a radiation receiving surface of the optical element, the first surface not having optical power and at least partly overlying the radiation receiving surface, and (iii) with respect to a second surface facing and immediately adjacent a radiation emitting surface of the optical element.

12. The method according to claim 11, wherein the first and/or second surface is within about 2 cm from respectively the radiation receiving or emitting surface of the optical element.

13. The method according to claim 11, wherein the first and/or second surface comprises a solid window or an open aperture having a width in the direction smaller than a width of the optical element in the direction.

14. The method according to claim 11, wherein moving the optical element comprises rotating the optical element.

15. The method according to claim 11, wherein a compartment is provided around the optical element, the first and/or second surface being part of the compartment.

16. The method according to claim 15, wherein the compartment is substantially gas tight.

17. A lithographic apparatus comprising:

a self-emissive contrast device configured to emit a beam;

a projection system configured to project the beam along an optical path onto a target surface of a substrate, the projection system comprising an optical element;

an actuator to move at least the optical element with respect to the substrate;

a surface facing and immediately adjacent a radiation receiving or emitting surface of the optical element and with respect to which the radiation receiving or emitting surface of the optical element is movable, the surface having an open aperture immediately adjacent the optical element, the aperture having a cross-sectional width smaller than a cross-sectional width of the optical element; and

a control system configured to cause the self-emissive contrast device to modulate emission of the beam during projection and to cause the actuator to move the optical element during projection with respect to the surface.

18. The apparatus according to claim 17, wherein the surface is within about 2 cm from the radiation receiving or emitting surface of the optical element.

19. The apparatus according to claim 17, comprising a further surface facing and immediately adjacent the other of the radiation receiving or emitting surface of the optical element, wherein the further surface comprises a solid window or an open aperture having a cross-sectional width smaller than a cross-sectional width of the optical element.

20. The apparatus according to claim 19, wherein the optical element is movable with respect to the further surface in a direction transverse to the optical path of the beam.