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Pattern-independent and hybrid matching/tuning including light manipulation by projection optics

  • US 9,378,309 B2
  • Filed: 06/03/2014
  • Issued: 06/28/2016
  • Est. Priority Date: 11/17/2010
  • Status: Active Grant
First Claim
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1. A method comprising:

  • obtaining, by a computer system comprising hardware, model coefficients representing optical behavior of a lithographic process;

    obtaining, by the computer system, model coefficients representing optical behavior of a reference lithographic process separate from the lithographic process to which the lithographic process is to be tuned, wherein tuning comprises substantially matching the optical behavior of the lithographic process to the reference lithographic process,wherein the obtained model coefficients for the lithographic process and the reference lithographic process both comprise a non-diagonalized matrix of elements; and

    tuning, by the computer system, the lithographic process to the reference lithographic process by determining values of a plurality of design variables representing adjustable characteristics of the lithographic process that cause a termination condition corresponding to a difference between the obtained model coefficients for the lithographic process and the reference lithographic process to be reached, the lithographic process being configured for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics.

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