Grounding dummy gate in scaled layout design
First Claim
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1. A semiconductor device, comprising:
- a dummy gate in a semiconductor device active area;
a first active contact adjacent to the dummy gate;
a first stacked contact electrically coupled to the first active contact and including a first isolation layer on sidewalls electrically isolating the first stacked contact from the dummy gate and a cap layer on a surface of the first stacked contact opposite the first active contact; and
a first via electrically coupled to the dummy gate and landing directly on the surface of the first stacked contact through a portion of the cap layer and directly contacting the first isolating layer on a sidewall of the first stacked contact, the first via arranged to electrically couple the first stacked contact and the first active contact to the dummy gate to ground the dummy gate.
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Abstract
A semiconductor device includes a gate and a first active contact adjacent to the gate. Such a device further includes a first stacked contact electrically coupled to the first active contact, including a first isolation layer on sidewalls electrically isolating the first stacked contact from the gate. The device also includes a first via electrically coupled to the gate and landing on the first stacked contact. The first via electrically couples the first stacked contact and the first active contact to the gate to ground the gate.
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Citations
15 Claims
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1. A semiconductor device, comprising:
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a dummy gate in a semiconductor device active area; a first active contact adjacent to the dummy gate; a first stacked contact electrically coupled to the first active contact and including a first isolation layer on sidewalls electrically isolating the first stacked contact from the dummy gate and a cap layer on a surface of the first stacked contact opposite the first active contact; and a first via electrically coupled to the dummy gate and landing directly on the surface of the first stacked contact through a portion of the cap layer and directly contacting the first isolating layer on a sidewall of the first stacked contact, the first via arranged to electrically couple the first stacked contact and the first active contact to the dummy gate to ground the dummy gate. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A semiconductor device, comprising:
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a dummy gate in a semiconductor device active area; a first active contact adjacent to the dummy gate; and an extended stacked contact directly electrically coupled to a gate contact of the dummy gate and the first active contact, and directly contacting a portion of an isolation layer between the gate contact and the first active contact, the extended stacked contact arranged to ground the dummy gate by at least partially overlapping both the dummy gate and the first active contact, the extended stacked contact being self-aligned with a neighbor stacked contact to electrically isolate the extended stacked contact from the neighbor stacked contact. - View Dependent Claims (8, 9)
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10. A semiconductor device, comprising:
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a dummy gate in a semiconductor device active area; a first active contact adjacent to the dummy gate; first means for electrically coupling to the first active contact including a first means for isolating the first electrical coupling means from the dummy gate and a cap layer on a surface of the first electrical coupling means opposite the first active contact; and a first via electrically coupled to the dummy gate and landing directly on the surface of the first electrical coupling means through a portion of the cap layer and directly contacting the first means for isolating on a sidewall of the first electrical coupling means, the first via arranged to electrically couple the first electrical coupling means and the first active contact to the dummy gate to ground the dummy gate. - View Dependent Claims (11, 12, 13, 14, 15)
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Specification